公开(公告)号：WO2021014198A1

公开(公告)日：2021-01-28

申请号：PCT/IB2019/056369

申请日：2019-07-25

Applicant: ARCELORMITTAL

Inventor： RUWET, Vincent ,  WILDERS, Dimitri

IPC: C23C14/56 ,  C23C16/54

Abstract: The invention relates to a deposition facility for continuously depositing coatings, formed from metallic and/or non-metallic materials, on a strip running along a path, the facility comprising a structural envelope, delimiting an inside and an outside, and a succession of process modules mounted on the structural envelope in such a way that the path to be followed by the running strip while going through the succession of process modules is wound a plurality of turns around an axis of the structural envelope.

公开(公告)号：WO2018020311A1

公开(公告)日：2018-02-01

申请号：PCT/IB2017/000876

申请日：2017-07-27

Applicant: ARCELORMITTAL

Inventor： PACE, Sergio ,  SILBERBERG, Eric ,  WILDERS, Dimitri ,  BONNEMANN, Rémy ,  GAOUYAT, Lucie

IPC: C23C14/24

Abstract: The invention relates to a vacuum deposition facility (1) for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element, the facility comprising a vacuum deposition chamber (2) and a means for running the substrate (5) through the chamber, wherein the facility further comprises: • - a vapor jet coater (3), • - an evaporation crucible (4) suited to feed the vapor jet coater with a vapor comprising the main element and the at least one additional element, • - a recharging furnace (9) suited to feed the evaporation crucible with the main element in molten state and capable of maintaining a constant level of liquid in the evaporation crucible, • - a feeding unit (11) suited to be fed with the at least one additional element in solid state and suited to feed the evaporation crucible with the at least one additional element indifferently in molten state, in solid state or partially in solid state. The invention also relates to a process for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element.

Abstract translation: 本发明涉及一种真空沉积设备（1），其用于在运行基板上连续沉积由金属合金形成的涂层，所述金属合金包括主要元件和至少一个附加元件，所述设施包括真空沉积 所述设备还包括： - 蒸气喷射涂覆器（3）; - 蒸发坩埚（4），其适于向所述蒸汽喷射涂覆器供给蒸汽喷射涂覆器 包括所述主元件和所述至少一个附加元件的蒸汽， - 再充料炉（9），其适于以熔融状态供给具有所述主元件的所述蒸发坩埚并且能够保持所述蒸发坩埚中的液体的恒定水平， - - 供给单元（11），其适合于以固态供给所述至少一个附加元件并且适合于以熔融状态，固态或部分地供给所述蒸发坩埚和所述至少一个附加元件 固体状态。 本发明还涉及一种在运行基材上连续沉积由包含主要元素和至少一种附加元素的金属合金形成的涂层的方法。

公开(公告)号：WO2021014393A1

公开(公告)日：2021-01-28

申请号：PCT/IB2020/056935

申请日：2020-07-23

Applicant: ARCELORMITTAL

Inventor： RUWET, Vincent ,  WILDERS, Dimitri

IPC: C23C14/56 ,  C23C16/54

Abstract: The invention relates to a deposition facility for continuously depositing coatings, formed from metallic and/or non-metallic materials, on a strip running along a path, the facility comprising a structural envelope, delimiting an inside and an outside, and a succession of individual process chambers mounted on the structural envelope in such a way that the path to be followed by the running strip while going through consecutively each individual process chamber of the succession of process chambers is rendered wound a plurality of turns around an axis of the structural envelope.

公开(公告)号：WO2018020296A1

公开(公告)日：2018-02-01

申请号：PCT/IB2016/054477

申请日：2016-07-27

Applicant: ARCELORMITTAL

Inventor： PACE, Sergio ,  SILBERBERG, Eric ,  WILDERS, Dimitri ,  BONNEMANN, Rémy ,  GAOUYAT, Lucie

IPC: C23C14/24

Abstract: The invention relates to a vacuum deposition facility (1) for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element, the facility comprising a vacuum deposition chamber (2) and a means for running the substrate (S) through the chamber, wherein the facility further comprises: - a vapor jet coater (3), - an evaporation crucible (4) suited to feed the vapor jet coater with a vapor comprising the main element and the at least one additional element, - a recharging furnace (9) suited to feed the evaporation crucible with the main element in molten state and capable of maintaining a constant level of liquid in the evaporation crucible, - a feeding unit (11) suited to be fed with the at least one additional element in solid state and suited to feed the evaporation crucible with the at least one additional element indifferently in molten state, in solid state or partially in solid state. The invention also relates to a process for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element.

Abstract translation: 本发明涉及一种真空沉积设备（1），其用于在运行基板上连续沉积由金属合金形成的涂层，所述金属合金包括主要元件和至少一个附加元件，所述设施包括真空沉积 （3）， - 蒸发坩埚（4），该蒸发坩埚（4）适于向蒸气喷射涂覆器供给蒸气（2）和用于使基板（S） 包括所述主元件和所述至少一个附加元件， - 再充电炉（9），其适于以熔融状态供给所述蒸发坩埚，并且所述主元件处于熔融状态并且能够保持所述蒸发坩埚中的恒定液位; - 供给单元 （11），其适合于供给至少一种处于固态的附加元件，并且适于以熔融状态，固态或部分固态向蒸发坩埚供给至少一种附加元件。 本发明还涉及一种在运行基材上连续沉积由包含主要元素和至少一种附加元素的金属合金形成的涂层的方法。