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    LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：WO2018108380A1

    公开(公告)日：2018-06-21

    申请号：PCT/EP2017/077950

    申请日：2017-11-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： EUMMELEN, Erik, Henricus, Egidius, Catharina ,  DEBOUGNOUX, Frank ,  CUYPERS, Koen ,  LEMPENS, Han, Henricus, Aldegonda ,  POLET, Theodorus, Wilhelmus ,  VIEYRA SALAS, Jorge, Alberto ,  BOMBEECK, John, Maria ,  MELMAN, Johannes, Cornelis, Paulus ,  GATTOBIGIO, Giovanni, Luca

    IPC: G03F7/20

    Abstract: An immersion lithography apparatus comprising: a support table (WT) configured to support an object (W) having at least one target portion (C); a projection system (PS) configured to project a patterned beam onto the object; a positioner (PW) configured to move the support table relative to the projection system; a liquid confinement structure (12) configured to confine a liquid to an immersion space (10) between the projection system and a surface of the object and/or the support table using a fluid flow into and/or out of the liquid confinement structure through a series of openings (60, 300) formed in the liquid confinement structure; and a controller configured to control the positioner to move the support table to follow a route comprised of a series of motions and to control the liquid confinement structure wherein each motion involves the support table moving relative to the liquid confinement structure such that a portion of the support table which moves from being not under the liquid confinement structure to being under the liquid confinement structure passes under a leading edge of the liquid confinement structure and a portion of the support table which moves from being under the liquid confinement structure to being not under the liquid confinement structure passes under a trailing edge of the liquid confinement structure, the controller adapted to: predict whether the liquid will be lost from the immersion space during at least one motion of the series of motions in which an edge of the immersion space passes over an edge of the object, and if liquid loss from the immersion space is predicted, to modify the fluid flow such that a first fluid flow rate into or out of an opening of the series of openings at the leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening of the series of openings at the trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the series of motions subsequent to the motion of predicted liquid loss.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2015124344A1

    公开(公告)日：2015-08-27

    申请号：PCT/EP2015/050936

    申请日：2015-01-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NAKIBOGLU, Günes ,  VAN BAREN, Martijn ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  CUYPERS, Koen ,  GOSEN, Jeroen, Gerard ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus

    IPC: G03F7/20

    CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

    Abstract: The present invention provides a lithographic apparatus comprising a barrier system (3) and device manufacturing method using any of the lithographic apparatus as described. The barrier system is used to maintain a protected volume of gas within a barrier (4). The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry of the present invention reduces the amount of ambient gas entering the protected volume from outside the barrier.

    Abstract translation: 本发明提供了一种包括屏障系统（3）的光刻设备和使用所描述的任何光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障（4）内。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度，尤其是在高速度下。 本发明的几何形状减少了从屏障外部进入受保护体积的环境气体的量。

    A PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS
    5.
    发明申请
    A PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS 审中-公开
    一种压力控制阀，一种用于光刻设备和光刻设备的流体处理结构

    公开(公告)号：WO2018072943A1

    公开(公告)日：2018-04-26

    申请号：PCT/EP2017/073509

    申请日：2017-09-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： JANSSENS, Stef, Marten, Johan ,  CUYPERS, Koen ,  CORTIE, Rogier, Hendrikus, Magdalena ,  SRIVASTAVA, Sudhir ,  RENCKENS, Theodorus, Johannes, Antonius ,  GOSEN, Jeroen, Gerard ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  SCHELLENS, Hendrikus, Johannes ,  HEEREN, Adrianus, Marinus, Wouter ,  LENSSEN, Bo

    IPC: G03F7/20 ,  F01D17/14 ,  F01D17/16 ,  F02B37/18 ,  G05D7/00 ,  G05D7/01 ,  F16K31/00 ,  H02N2/04

    Abstract: A pressure control valve comprising: a passageway (210) having a portion defining an opening (220) for the flow of liquid and/or gas (215) therethrough; an obstructing member (230) displaceable relative to the opening for obstructing the opening by differing amounts thereby to regulate a volumetric flow rate of liquid and/or gas through the opening; a piezo actuator (250); and a linkage mechanism (400) adapted to amplify a magnitude of a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the obstructing member relative to the opening, wherein the linkage mechanism comprises a frame (500) attached to a wall and fixed at a first end (510) in relation to the passageway, a movable portion (508) of the frame moveable in a first direction whilst being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the moveable portion such that an expansion of the piezo actuator results in movement of the moveable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the obstructing member.

    Abstract translation: 压力控制阀，包括：通道（210），其具有限定用于使液体和/或气体（215）流过的开口（220）的部分; 阻塞构件（230），所述阻塞构件（230）相对于所述开口可移位，用于以不同的量阻塞所述开口，从而调节通过所述开口的液体和/或气体的体积流率; 一个压电致动器（250）; 以及连杆机构（400），其适于放大压电致动器中的尺寸变化的大小并且使用放大的尺寸变化来相对于所述开口移动所述阻塞构件，其中所述连杆机构包括框架（500），所述框架 并且相对于所述通道固定在第一端部（510）处，所述框架的可移动部分（508）可沿第一方向移动，同时基本上限制在与所述第一方向正交的第二方向上，所述压电致动器在所述第一方向 壁和可移动部分，使得压电致动器的扩张导致可移动部分在第一方向上的移动量大于压电致动器的扩张量，可移动部分连接到阻隔构件。

    FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
    6.
    发明申请
    FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS 审中-公开
    光刻设备的流体处理结构

    公开(公告)号：WO2018046329A1

    公开(公告)日：2018-03-15

    申请号：PCT/EP2017/071509

    申请日：2017-08-28

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN DEN EIJNDEN, Pepijn ,  ROPS, Cornelius, Maria ,  POLET, Theodorus, Wilhelmus ,  KEUKENS, Floor, Lodewijk ,  TANASA, Gheorghe ,  CORTIE, Rogier, Hendrikus, Magdalena ,  CUYPERS, Koen ,  BUDDENBERG, Harold, Sebastiaan ,  GATTOBIGIO, Giovanni, Luca ,  VAN VLIET, Evert ,  TEN KATE, Nicolaas ,  FRENCKEN, Mark, Johannes, Hermanus ,  VAN ERVE, Jantien, Laura ,  TEUNISSEN, Marcel, Maria, Cornelius, Franciscus

    IPC: G03F7/20

    Abstract: A fluid handling structure (12) configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising: an aperture (15) formed therein for the passage there through of a projection beam through the immersion fluid; a first part (100); and a second part (200); and wherein at least one of the first part and the second part define a surface (20) adapted for the extraction of the immersion fluid from the region; and wherein the fluid handling structure is adapted to provide a fluid flow into or out of the surface of the fluid handling structure and wherein movement of the first part relative to the second part is effective to change a position of the fluid flow into or out of the surface relative to the aperture, and wherein one of the first part and second part comprises at least one through-hole (51, 61) for the fluid flow there through and the other of the first part and second part comprises at least one opening (55, 65) for the fluid flow there through, the at least one through-hole and at least one opening being in fluid communication when aligned, the movement allowing alignment of the at least one opening with different ones of the at least one through-hole thereby to change the position of the fluid flow into or out of the surface relative to the aperture.

    Abstract translation: 一种流体处理结构（12），其被配置为将浸没流体限制到光刻设备的区域，所述流体处理结构包括：孔（15），其中形成有用于使得通过其中的投影光束 通过浸液; 第一部分（100）; 和第二部分（200）; 并且其中所述第一部分和所述第二部分中的至少一个限定适于从所述区域提取所述浸没流体的表面（20）;其中， 并且其中流体处理结构适于提供流体流入或流出流体处理结构的表面，并且其中第一部分相对于第二部分的移动有效地改变流体流入或流出 所述表面相对于所述孔口，并且其中所述第一部分和所述第二部分中的一个包括用于流体流过的至少一个通孔（51,61），并且所述第一部分和所述第二部分中的另一个包括至少一个开口 （55,65），所述至少一个通孔和至少一个开口在对齐时流体连通，所述移动允许所述至少一个开口与所述至少一个通孔中的不同通孔对准 从而改变流体流入或流出表面相对于孔的位置。

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