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    ESTIMATING DEFORMATION OF A PATTERNING DEVICE AND/OR A CHANGE IN ITS POSITION
    2.
    发明申请
    ESTIMATING DEFORMATION OF A PATTERNING DEVICE AND/OR A CHANGE IN ITS POSITION 审中-公开
    估计设计的变形和/或其位置的变化

    公开(公告)号：WO2015165623A1

    公开(公告)日：2015-11-05

    申请号：PCT/EP2015/054650

    申请日：2015-03-05

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： MOEST, Bearrach ,  DELMASTRO, Peter, A. ,  ONVLEE, Johannes ,  VAN DER WIELEN, Adrianus, Martinus ,  WARD, Christopher, Charles

    IPC: G03F7/20

    CPC classification number: G03F7/70616 ,  G01B11/14 ,  G03F7/70058 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70875

    Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.

    Abstract translation: 提供了一种用于确定图案形成装置相对于图案形成装置的变形和/或移动位置的系统和方法。 该系统包括测量图案形成装置上的多个参考标记的相应位置的第一感测子系统和测量图案形成装置的边缘相对于支撑件的位置的第二感测子系统。 该系统还包括一个控制器，用于基于测量的图案形成装置上的标记的相应位置来确定图案化部分的绝对位置和绝对位置的变化，基于图案化装置的边缘确定相对位置的变化 测量边缘位置，并且估计图案形成装置相对于支撑件的位置的变化以及图案形成装置的图案化部分的图案变形在一段时间内的变化。

    RETICLE HEATER TO KEEP RETICLE HEATING UNIFORM
    3.
    发明申请
    RETICLE HEATER TO KEEP RETICLE HEATING UNIFORM 审中-公开
    反应加热器保持加热均匀

    公开(公告)号：WO2014048651A1

    公开(公告)日：2014-04-03

    申请号：PCT/EP2013/067615

    申请日：2013-08-26

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： ONVLEE, Johannes ,  MASON, Christopher ,  EBERT, Earl ,  DELMASTRO, Peter

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/708

    Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.

    Abstract translation: 公开了用于控制掩模版加热的系统和方法。 在一个实施例中，多个辐射源产生多个辐射束（206）并且将它们传送到图案形成装置（210），该图案形成装置吸收来自光束的一部分辐射并产生空间上依赖的加热曲线。 在另一实施例中，多个电阻加热源（906）响应于所施加的电压或电流产生热量。 产生的热量被图案形成装置从电阻加热源吸收并导致空间依赖的加热曲线的发展。 可以通过控制空间依赖的加热曲线来控制热应力，应变和变形。

    RETICLE CLEANING BY MEANS OF STICKY SURFACE
    5.
    发明申请
    RETICLE CLEANING BY MEANS OF STICKY SURFACE 审中-公开
    用手表表面清理

    公开(公告)号：WO2014032887A1

    公开(公告)日：2014-03-06

    申请号：PCT/EP2013/065966

    申请日：2013-07-30

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： ONVLEE, Johannes ,  MASON, Christopher ,  DELMASTRO, Peter ,  SINGH, Sanjeev ,  ALBRIGHT, Ronald

    IPC: G03F7/20 ,  G03F1/82 ,  B08B7/00 ,  A47L25/00 ,  H01L21/02

    CPC classification number: G03F7/70925 ,  A47L25/005 ,  B08B7/0028 ,  G03F1/82 ,  G03F7/70916 ,  H01L21/02041

    Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.

    Abstract translation: 描述了用于从光刻设备内的物体表面清洁污染物的方法和系统。 提供了一种光刻设备，其包括被配置为调节辐射束的照明系统，构造成保持图案形成装置（302）的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括用于从支撑体或图案形成装置的表面清除颗粒的清洁系统（500）。 清洁系统包括设计成接触支撑件或图案形成装置的表面的清洁表面（502）。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2011144387A1

    公开(公告)日：2011-11-24

    申请号：PCT/EP2011/055500

    申请日：2011-04-08

    Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DEKKER, Albert ,  SPIERDIJK, Johannus ,  DE MAN, Hendrik

    Inventor： ONVLEE, Johannes ,  DEKKER, Albert ,  SPIERDIJK, Johannus ,  DE MAN, Hendrik

    IPC: G03F7/20 ,  G02B27/00

    CPC classification number: G03F7/70916 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70883

    Abstract: A lithographic apparatus including an optical column to project a beam on a target portion of a substrate is disclosed, the optical column having a projection system configured to project the beam onto the target portion. The apparatus further includes an actuator to move the optical column or at least part thereof with respect to the substrate and a window (940) between the moving part of the optical column and the target portion of the substrate and/or between the moving part of the optical column and a non -moving part of the optical column, the window constructed and arranged within the apparatus to reduce or minimize movement of the window.

    Abstract translation: 公开了一种包括在基板的目标部分上投射光束的光学柱的光刻设备，该光学柱具有被配置为将光束投影到目标部分上的投影系统。 该装置还包括致动器，用于相对于基板移动光学柱或其至少一部分，以及在光学柱的运动部分和基板的目标部分之间和/或在基板的移动部分之间的窗口（940） 光学柱和光学柱的非移动部分，窗口构造和布置在设备内以减少或最小化窗口的移动。

    METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRUCTURE ON A SUBSTRATE, METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A SUBSTRATE
    10.
    发明申请
    METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRUCTURE ON A SUBSTRATE, METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A SUBSTRATE 审中-公开
    确定衬底上目标结构位置的方法和装置，确定衬底位置的方法和装置

    公开(公告)号：WO2017215924A1

    公开(公告)日：2017-12-21

    申请号：PCT/EP2017/063252

    申请日：2017-06-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BIJNEN, Franciscus, Godefridus, Casper ,  BOSHOUWERS, Augustinus, Hubert, Maria ,  ONVLEE, Johannes

    IPC: G03F9/00 ,  H01L21/68

    Abstract: A target structure (402) such as an alignment mark on a semiconductor substrate (400) becomes obscured by an opaque layer (408) so that it cannot be located by an alignment sensor (AS). A position for the mark is determined using an edge position sensor (412) and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window (410) can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can if desired measure more accurately the position of the target structure, for use in controlling further lithographic steps. The edge position sensor may be a camera having an angle-selective behaviour. The edge position sensor may be integrated within the alignment sensor hardware.

    Abstract translation: 诸如半导体衬底（400）上的对准标记之类的目标结构（402）变得被不透明层（408）遮挡，使得它不能被对准传感器（AS）定位。 使用边缘位置传感器（412）确定标记的位置，并且在形成不透明层之前存储限定标记相对于衬底的一个或多个边缘部分的位置的相对位置信息。 基于确定的位置，窗口（410）可以在不透明层中打开。 在揭示目标结构之后，如果需要，对准传感器可以更准确地测量目标结构的位置，以用于控制进一步的光刻步骤。 边缘位置传感器可以是具有角度选择行为的照相机。 边缘位置传感器可以集成在对准传感器硬件中。

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