Abstract:
A pressure control valve comprising: a passageway (210) having a portion defining an opening (220) for the flow of liquid and/or gas (215) therethrough; an obstructing member (230) displaceable relative to the opening for obstructing the opening by differing amounts thereby to regulate a volumetric flow rate of liquid and/or gas through the opening; a piezo actuator (250); and a linkage mechanism (400) adapted to amplify a magnitude of a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the obstructing member relative to the opening, wherein the linkage mechanism comprises a frame (500) attached to a wall and fixed at a first end (510) in relation to the passageway, a movable portion (508) of the frame moveable in a first direction whilst being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the moveable portion such that an expansion of the piezo actuator results in movement of the moveable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the obstructing member.
Abstract:
A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
Abstract:
The present invention relates to a system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. In accordance with the invention, a plurality of air bearing devices is provided. Each air bearing device comprises: - an air bearing body, which has a free surface, - a primary channel which extends through the air bearing body and has an inlet opening in the free surface, - a secondary channel system which extends through the air bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.