公开(公告)号：WO2016020121A1

公开(公告)日：2016-02-11

申请号：PCT/EP2015/064793

申请日：2015-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  BLANCO CARBALLO, Victor, Manuel ,  DE GROOT, Casper, Roderik ,  CUSTERS, Rolf, Hendrikus, Jacobus ,  PHILLIPS, David, Merritt ,  VAN DER ZANDEN, Frederik, Antonius ,  GUNTER, Pieter, Lein, Joseph ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  WOUTERS, Marijn ,  KOX, Ronald, Frank ,  VIEYRA SALAS, Jorge, Alberto

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller (500) configured to control a substrate table (WT) to move along an exposure route including in order: an entry motion (R2) in which the substrate moves from an off-substrate position at which the immersion space (10) does not overlap the substrate (W) to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion (R3, R4) in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned bean is not projected onto the substrate during the entry motion and the transfer motion.

Abstract translation: 浸没式光刻设备具有控制器（500），其被配置为控制衬底台（WT）沿着包括以下顺序的曝光路线移动：进入运动（R2），其中衬底从浸没 空间（10）不与衬底（W）重叠到浸没空间至少部分地与衬底重叠的衬底上位置，衬底台改变速度和/或方向的转移运动（R3，R4）和 在基板移动到基板上位置之后移动至少一个传送时间，以及曝光动作，其中基板被扫描并且图案化的光束投影到基板上，其中贯穿整个传送运动至少一部分浸没 空间与衬底重叠，并且其中图案化的豆在进入运动和转移运动期间不投影到衬底上。