公开(公告)号：WO2016096508A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/078842

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  STALS, Walter, Theodorus, Matheus ,  BESSEMS, David ,  GATTOBIGIO, Giovanni, Luca ,  BLANCO CARBALLO, Victor, Manuel ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DER HAM, Ronald ,  VAN DER ZANDEN, Frederik, Antonius ,  WERNAART, Wilhelmus, Antonius

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03B27/52 ,  B01D19/0005 ,  B01D19/0021 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO 2 gas so as to provide a substantially pure CO 2 gas environment adjacent to, and radially outward of, the space.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构被构造成将浸没流体容纳到一个区域中，所述流体处理结构在一个空间的边界处具有：至少一个气刀开口，其沿径向向外方向 空间; 以及至少一个气体供应开口，所述气体供应开口相对于所述空间在至少气刀开口的径向向外方向上。 气刀开口和气体供应开口都提供基本上纯净的CO 2气体，以提供邻近并且径向向外的基本上纯的CO 2气体环境 空间。

公开(公告)号：WO2016020121A1

公开(公告)日：2016-02-11

申请号：PCT/EP2015/064793

申请日：2015-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  BLANCO CARBALLO, Victor, Manuel ,  DE GROOT, Casper, Roderik ,  CUSTERS, Rolf, Hendrikus, Jacobus ,  PHILLIPS, David, Merritt ,  VAN DER ZANDEN, Frederik, Antonius ,  GUNTER, Pieter, Lein, Joseph ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  WOUTERS, Marijn ,  KOX, Ronald, Frank ,  VIEYRA SALAS, Jorge, Alberto

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller (500) configured to control a substrate table (WT) to move along an exposure route including in order: an entry motion (R2) in which the substrate moves from an off-substrate position at which the immersion space (10) does not overlap the substrate (W) to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion (R3, R4) in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned bean is not projected onto the substrate during the entry motion and the transfer motion.

Abstract translation: 浸没式光刻设备具有控制器（500），其被配置为控制衬底台（WT）沿着包括以下顺序的曝光路线移动：进入运动（R2），其中衬底从浸没 空间（10）不与衬底（W）重叠到浸没空间至少部分地与衬底重叠的衬底上位置，衬底台改变速度和/或方向的转移运动（R3，R4）和 在基板移动到基板上位置之后移动至少一个传送时间，以及曝光动作，其中基板被扫描并且图案化的光束投影到基板上，其中贯穿整个传送运动至少一部分浸没 空间与衬底重叠，并且其中图案化的豆在进入运动和转移运动期间不投影到衬底上。