公开(公告)号：WO2017008993A1

公开(公告)日：2017-01-19

申请号：PCT/EP2016/063961

申请日：2016-06-16

Applicant: ASML NETHERLANDS B.V.

Inventor： SAEED, Seerwan ,  GATTOBIGIO, Giovanni, Luca ,  YU, Miao ,  EUMMELEN, Erik, Henricus, Egidius,Catharina ,  MIGCHELBRINK, Ferdy ,  VAN SOMMEREN, Daan, Daniel, Johannes,Antonius ,  VAN DE WINKEL, Jimmy, Matheus,Wilhelmus ,  RAAYMAKERS, Jeroen, Arnoldus, Leonardus, Johannes ,  RAS, Arnoldus, Johannes, Martinus, Jozeph ,  ARTS, Petrus, Martinus, Gerardus, Johannes ,  BUDDENBERG, Harold, Sebastiaan ,  KEUKENS,, Floor, Lodewijk ,  TANASA, Gheorghe ,  WOUTERS, Marijn

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/7085 ,  G01N21/9515 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70916 ,  H01L22/12 ,  H01L27/14627 ,  H01L27/14678 ,  H01L27/14862

Abstract: An inspection substrate (IW) for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus. The inspection substrate comprises a body (200) having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus and a sensor, e.g. an imaging device (210) or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor being embedded in the body.

Abstract translation: 用于检查部件的检查基板（IW），例如 液体限制系统，用于处理生产衬底的设备，例如， 光刻设备。 检查基板包括具有与生产基板相似的尺寸的主体（200），使得检查基板与装置和传感器（例如，传感器）兼容。 成像装置（210）或压力传感器，用于产生与靠近检查基板的装置的部件的参数有关的检查信息，传感器嵌入在主体中。

公开(公告)号：WO2016020121A1

公开(公告)日：2016-02-11

申请号：PCT/EP2015/064793

申请日：2015-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  BLANCO CARBALLO, Victor, Manuel ,  DE GROOT, Casper, Roderik ,  CUSTERS, Rolf, Hendrikus, Jacobus ,  PHILLIPS, David, Merritt ,  VAN DER ZANDEN, Frederik, Antonius ,  GUNTER, Pieter, Lein, Joseph ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  WOUTERS, Marijn ,  KOX, Ronald, Frank ,  VIEYRA SALAS, Jorge, Alberto

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller (500) configured to control a substrate table (WT) to move along an exposure route including in order: an entry motion (R2) in which the substrate moves from an off-substrate position at which the immersion space (10) does not overlap the substrate (W) to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion (R3, R4) in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned bean is not projected onto the substrate during the entry motion and the transfer motion.

Abstract translation: 浸没式光刻设备具有控制器（500），其被配置为控制衬底台（WT）沿着包括以下顺序的曝光路线移动：进入运动（R2），其中衬底从浸没 空间（10）不与衬底（W）重叠到浸没空间至少部分地与衬底重叠的衬底上位置，衬底台改变速度和/或方向的转移运动（R3，R4）和 在基板移动到基板上位置之后移动至少一个传送时间，以及曝光动作，其中基板被扫描并且图案化的光束投影到基板上，其中贯穿整个传送运动至少一部分浸没 空间与衬底重叠，并且其中图案化的豆在进入运动和转移运动期间不投影到衬底上。