公开(公告)号：WO2020099072A1

公开(公告)日：2020-05-22

申请号：PCT/EP2019/078655

申请日：2019-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  DONMEZ, Inci ,  GIESBERS, Adrianus, Johannes, Maria ,  HOUWELING, Zomer, Silvester ,  KLEIN, Alexander, Ludwig ,  KLOOTWIJK, Johan, Hendrik ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm 2 . The membrane may have a substrate layer for supporting the metallic or semimetallic layer, the substrate layer comprising for example silicon obtained from silicon on insulator or polysilicon.