公开(公告)号：WO2020099072A1

公开(公告)日：2020-05-22

申请号：PCT/EP2019/078655

申请日：2019-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  DONMEZ, Inci ,  GIESBERS, Adrianus, Johannes, Maria ,  HOUWELING, Zomer, Silvester ,  KLEIN, Alexander, Ludwig ,  KLOOTWIJK, Johan, Hendrik ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm 2 . The membrane may have a substrate layer for supporting the metallic or semimetallic layer, the substrate layer comprising for example silicon obtained from silicon on insulator or polysilicon.

公开(公告)号：WO2023025511A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/071251

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： AGRICOLA, Franciscus, Theodorus ,  FERRE LLIN, Lourdes ,  DE GRAAF, Dennis ,  ANDE, Chaitanya Krishna ,  DONMEZ NOYAN, Inci ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  ROLLIER, Anne-Sophie ,  BIRON, Maxime ,  GIESBERS, Adrianus, Johannes, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.