公开(公告)号：WO2023066683A1

公开(公告)日：2023-04-27

申请号：PCT/EP2022/077938

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： DE VRIES, Gosse, Charles ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  JANSSEN, Franciscus, Johannes, Joseph ,  KURGANOVA, Evgenia ,  WOLF, Abraham, Jan ,  BAKKER, Ties, Jan, Willem ,  HILDENBRAND, Volker, Dirk ,  VERMEULEN, Paul, Alexander ,  ENGEL, Michael ,  LUTTIKHUIS, Bernardus, Antonius, Johannes ,  VAN DER HAM, Ronald ,  VAN LIPZIG, Jeroen, Peterus, Johannes

IPC: G03F1/62 ,  G03F7/20

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.