公开(公告)号：WO2016096508A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/078842

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  STALS, Walter, Theodorus, Matheus ,  BESSEMS, David ,  GATTOBIGIO, Giovanni, Luca ,  BLANCO CARBALLO, Victor, Manuel ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DER HAM, Ronald ,  VAN DER ZANDEN, Frederik, Antonius ,  WERNAART, Wilhelmus, Antonius

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03B27/52 ,  B01D19/0005 ,  B01D19/0021 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO 2 gas so as to provide a substantially pure CO 2 gas environment adjacent to, and radially outward of, the space.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构被构造成将浸没流体容纳到一个区域中，所述流体处理结构在一个空间的边界处具有：至少一个气刀开口，其沿径向向外方向 空间; 以及至少一个气体供应开口，所述气体供应开口相对于所述空间在至少气刀开口的径向向外方向上。 气刀开口和气体供应开口都提供基本上纯净的CO 2气体，以提供邻近并且径向向外的基本上纯的CO 2气体环境 空间。

公开(公告)号：WO2016012193A1

公开(公告)日：2016-01-28

申请号：PCT/EP2015/064500

申请日：2015-06-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: Lithographic apparatus and device manufacturing methods are disclosed. In one arrangement there is provided an immersion lithographic apparatus comprising a projection system (PS). The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system comprises a first surface (102). The first surface has a non-planar shape. An element (106) is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element comprises a closed loop of continuously integral material in a preformed state and conforming to the non-planar shape of the first surface.

Abstract translation: 公开了平版印刷设备和设备制造方法。 在一种布置中，提供了包括投影系统（PS）的浸没式光刻设备。 投影系统被配置为将图案化的辐射束通过浸没液投影到基板的目标部分上。 投影系统的外表面包括第一表面（102）。 第一表面具有非平面形状。 元件（106）附接到第一表面并且定位成使得至少一部分元件在使用中接触浸没液体。 该元件包括处于预成型状态并与第一表面的非平面形状一致的连续整体材料的闭环。

公开(公告)号：WO2023066683A1

公开(公告)日：2023-04-27

申请号：PCT/EP2022/077938

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： DE VRIES, Gosse, Charles ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  JANSSEN, Franciscus, Johannes, Joseph ,  KURGANOVA, Evgenia ,  WOLF, Abraham, Jan ,  BAKKER, Ties, Jan, Willem ,  HILDENBRAND, Volker, Dirk ,  VERMEULEN, Paul, Alexander ,  ENGEL, Michael ,  LUTTIKHUIS, Bernardus, Antonius, Johannes ,  VAN DER HAM, Ronald ,  VAN LIPZIG, Jeroen, Peterus, Johannes

IPC: G03F1/62 ,  G03F7/20

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.

公开(公告)号：WO2021047911A1

公开(公告)日：2021-03-18

申请号：PCT/EP2020/073867

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  STEFFENS, Koen ,  VAN DER HAM, Ronald ,  PIETERSE, Gerben ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  FAHRNI, Francis

IPC: G03F7/20

Abstract: A fluid handling system for wetting a region of a surface of a substrate irradiated by a radiation beam. The fluid handling system comprises a first device (112) configured to confine a first liquid to a first space (111) between at least a part of the first device and the surface of the substrate. The first device comprising an aperture (10) formed therein for the passage therethrough of the radiation beam (B) to irradiate the region by passing through the first liquid. The first device comprising at least one first liquid supply member (20, 23, 34) configured to provide the first liquid to the first space and at least one extraction member (32) configured to remove liquid from the first space. The fluid handling system further comprises a second device (200) comprising at least one second liquid supply member (201) configured to provide a second liquid to a second space (211) between at least a part of the second device and the surface of the substrate, wherein there is a gap (g) on the surface of the substrate between the second liquid and the first liquid. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer over at least the region, and is configured to provide the first liquid and the second liquid on the surface of the substrate simultaneously.

公开(公告)号：WO2016000903A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062525

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341

Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

公开(公告)号：WO2015193036A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/060427

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

Abstract: A lithographic apparatus comprises a substrate table, post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is for handling the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a wafer handler.

Abstract translation: 光刻设备包括基板台，曝光后处理模块，基板处理机器人和干燥台。 衬底台被配置为支撑用于曝光过程的衬底。 后曝光处理模块用于处理基板曝光后。 衬底处理机器人被配置为沿着衬底卸载路径将衬底从衬底台转移到后曝光处理模块中。 干燥站构造成主动地从基板的表面移除液体。 干燥站位于基板卸载路径中。 干燥站位于曝光后处理模块中。 后曝光处理模块可以是晶片处理器。