公开(公告)号：WO2019034342A1

公开(公告)日：2019-02-21

申请号：PCT/EP2018/068961

申请日：2018-07-12

Applicant: ASML NETHERLANDS B.V.

Inventor： YAGUBIZADE, Hadi ,  ERDAMAR, Ahmet Koray ,  CEKLI, Hakki, Ergun

IPC: G03F7/20

Abstract: Disclosed herein is a method for correcting values of one or more feed-forward parameters used in a process of patterning substrates, the method comprising: obtaining measured overlay and/or alignment error data of a patterned substrate; calculating one or more correction values for the one or more feed-forward parameters in dependence on the measured overlay and/or alignment error data.

公开(公告)号：WO2019063245A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/073663

申请日：2018-09-04

Applicant: ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius Jacobus ,  HULSEBOS, Edo, Maria ,  MEGENS, Henricus, Johannes, Lambertus ,  ERDAMAR, Ahmet Koray ,  VERHEES, Loek, Johannes, Petrus ,  ROELOFS, Willem, Seine, Christian ,  VAN DE VEN, Wendy, Johanna, Martina ,  YAGUBIZADE, Hadi ,  CEKLI, Hakki, Ergun ,  BRINKHOF, Ralph ,  VU, Tran, Thanh, Thuy ,  GOOSEN, Maikel, Robert ,  VAN T WESTEINDE, Maaike ,  KOU, Weitian ,  RIJPSTRA, Manouk ,  COX, Matthijs ,  BIJNEN, Franciscus, Godefridus, Casper

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.