公开(公告)号：WO2022008174A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065947

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： GUO, Chaoqun ,  KHEDEKAR, Satej, Subhash ,  GANTAPARA, Anjan Prasad ,  LIN, Chenxi ,  CASTELIJNS, Henricus, Jozef ,  CHEN, Hongwei ,  BOND, Stephen Henry ,  LI, Zhaoze ,  MOSSAVAT, Seyed Iman ,  ZOU, Yi ,  YPMA, Alexander ,  ZHANG, Youping ,  DICKER, Gerald ,  STEINMEIER, Ewout, Klaas ,  VAN BERKEL, Koos ,  BOLDER, Joost, Johan ,  HUBAUX, Arnaud ,  HLOD, Andriy, Vasyliovich ,  GONZALEZ HUESCA, Juan Manuel ,  AARDEN, Frans Bernard

IPC: G03F7/20

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input comprises one or more parameters used in the patterning process. The control output is generated with a trained machine learning model based on the control input. The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data. The training data comprises 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.