公开(公告)号：WO2022008174A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065947

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： GUO, Chaoqun ,  KHEDEKAR, Satej, Subhash ,  GANTAPARA, Anjan Prasad ,  LIN, Chenxi ,  CASTELIJNS, Henricus, Jozef ,  CHEN, Hongwei ,  BOND, Stephen Henry ,  LI, Zhaoze ,  MOSSAVAT, Seyed Iman ,  ZOU, Yi ,  YPMA, Alexander ,  ZHANG, Youping ,  DICKER, Gerald ,  STEINMEIER, Ewout, Klaas ,  VAN BERKEL, Koos ,  BOLDER, Joost, Johan ,  HUBAUX, Arnaud ,  HLOD, Andriy, Vasyliovich ,  GONZALEZ HUESCA, Juan Manuel ,  AARDEN, Frans Bernard

IPC: G03F7/20

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input comprises one or more parameters used in the patterning process. The control output is generated with a trained machine learning model based on the control input. The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data. The training data comprises 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.

公开(公告)号：WO2015185269A1

公开(公告)日：2015-12-10

申请号：PCT/EP2015/058870

申请日：2015-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： BERENDSEN, Christianus, Wilhelmus, Johannes ,  BECKERS, Marcel ,  CASTELIJNS, Henricus, Jozef ,  GERAETS, Hubertus, Antonius ,  KOEVOETS, Adrianus, Hendrik ,  LEVASIER, Leon, Martin ,  SCHAAP, Peter ,  STREEFKERK, Bob ,  TROMP, Siegfried, Alexander

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Abstract translation: 一种用于补偿包括衬底台的光刻设备的曝光过程中的曝光误差的方法，所述方法包括：获得表示达到衬底水平的IR辐射的剂量的剂量测量，其中所述剂量测量可以用于 计算在曝光过程中由光刻设备中的物体吸收的IR辐射的量; 并且使用剂量测量来控制曝光过程，以便补偿在曝光过程期间被物体吸收的IR辐射相关的曝光误差。