公开(公告)号：WO2022028805A1

公开(公告)日：2022-02-10

申请号：PCT/EP2021/068888

申请日：2021-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： KOULIERAKIS, Eleftherios ,  LANCIA, Carlo ,  GONZALEZ HUESCA, Juan Manuel ,  YPMA, Alexander

IPC: G06N20/00 ,  G03F7/20 ,  G03F9/00

Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method comprises obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.

公开(公告)号：WO2021197730A1

公开(公告)日：2021-10-07

申请号：PCT/EP2021/054988

申请日：2021-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： KOULIERAKIS, Eleftherios ,  LANCIA, Carlo ,  GONZALEZ HUESCA, Juan Manuel ,  YPMA, Alexander ,  GKOROU, Dimitra ,  SAHRAEIAN, Reza

IPC: G03F7/20 ,  G03F7/705 ,  G03F7/70525

Abstract: Described is a method for determining an inspection strategy for at least one substrate, the method comprising: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre- processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for said at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.

公开(公告)号：WO2022008174A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065947

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： GUO, Chaoqun ,  KHEDEKAR, Satej, Subhash ,  GANTAPARA, Anjan Prasad ,  LIN, Chenxi ,  CASTELIJNS, Henricus, Jozef ,  CHEN, Hongwei ,  BOND, Stephen Henry ,  LI, Zhaoze ,  MOSSAVAT, Seyed Iman ,  ZOU, Yi ,  YPMA, Alexander ,  ZHANG, Youping ,  DICKER, Gerald ,  STEINMEIER, Ewout, Klaas ,  VAN BERKEL, Koos ,  BOLDER, Joost, Johan ,  HUBAUX, Arnaud ,  HLOD, Andriy, Vasyliovich ,  GONZALEZ HUESCA, Juan Manuel ,  AARDEN, Frans Bernard

IPC: G03F7/20

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input comprises one or more parameters used in the patterning process. The control output is generated with a trained machine learning model based on the control input. The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data. The training data comprises 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.

公开(公告)号：WO2020156769A1

公开(公告)日：2020-08-06

申请号：PCT/EP2020/050354

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： HUBAUX, Arnaud ,  BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KUNNEN, Johan, Gertrudis, Cornelis ,  PONGERS, Willem, Richard ,  DAWARE, Ajinkya, Ravindra ,  LI, Chung-Hsun ,  TSIROGIANNIS, Georgios ,  BORGER, Hendrik, Cornelis, Anton ,  DE JONG, Frederik Eduard ,  GONZALEZ HUESCA, Juan Manuel ,  HLOD, Andriy, Vasyliovich ,  PISARENCO, Maxim

IPC: G03F7/20 ,  G05B23/02 ,  G05B19/418

Abstract: Described is a method for categorizing a substrate subject to a semiconductor manufacturing process comprising multiple operations, the method comprising: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model comprising one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.