SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
    1.
    发明申请
    SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
    传感器系统,基板处理系统和平面设备

    公开(公告)号:WO2015135782A1

    公开(公告)日:2015-09-17

    申请号:PCT/EP2015/054276

    申请日:2015-03-02

    Abstract: The invention relates to a sensor system (PSS) configured to determine a position of a substrate (W) having an edge (WE). The sensor system comprises a radiation source (LS) arranged to emit a radiation bundle (LB), a reflective element (RE), a detector device (DD) and a substrate table (PWT) having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

    Abstract translation: 本发明涉及一种被配置为确定具有边缘(WE)的衬底(W)的位置的传感器系统(PSS)。 传感器系统包括布置成发射辐射束(LB)的辐射源(LS),反射元件(RE),检测器装置(DD)和具有用于支撑衬底的支撑表面的衬底台(PWT)。 支撑表面至少部分地沿着平面。 辐射源和检测器装置布置在平面的第一侧上。 反射元件布置在除了第一侧之外的平面的第二侧上。 反射元件布置成通过反射辐射束来产生反射束。 反射元件布置成用反射束照射边缘。 检测器装置被布置成接收反射束。

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