公开(公告)号：WO2016005117A1

公开(公告)日：2016-01-14

申请号：PCT/EP2015/062504

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： KERSSEMAKERS, Sander ,  DE BOEIJ, Wilhelmus, Petrus ,  DE LANGE, Gerben, Frank ,  HOOGENDAM, Christiaan, Alexander ,  VAN GILS, Petrus, Franciscus ,  KAMMINGA, Jelmer, Mattheüs ,  KUIT, Jan Jaap ,  SCHOORMANS, Carolus, Johannes, Catharina

IPC: G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

Abstract translation: 一种光刻设备，包括支撑结构，该支撑结构构造成在单次扫描操作期间，当在单次扫描操作期间支撑具有第一扫描方向的扫描距离的图案形成装置时，在单次扫描操作期间移动第一扫描距离， 在扫描方向上具有第二范围的图案形成装置以及在单次扫描操作期间被移动第三扫描距离的基板台，当支撑结构支撑具有在扫描方向上具有第一范围的图案形成装置并被移动时 当支撑结构支撑具有在扫描方向上的第二范围的图案形成装置时，在单次扫描操作期间第四扫描距离。