公开(公告)号：WO2017137129A1

公开(公告)日：2017-08-17

申请号：PCT/EP2016/082484

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： JEUNINK, Andre, Bernardus ,  MARTENS, Robby, Franciscus, Josephus ,  DE VOS, Youssef, Karel, Maria ,  VAN DORST, Ringo, Petrus, Cornelis ,  TEN BRINKE, Gerhard, Albert ,  SENDEN, Dirk, Jerome, Andre ,  BALTIS, Coen, Hubertus, Matheus ,  GERRITZEN, Justin, Johannes, Hermanus ,  KAMMINGA, Jelmer, Mattheüs ,  PACITTI, Evelyn, Wallis ,  POIESZ, Thomas ,  SCHEIBERLICH, Arie, Cornelis ,  SCHOLTEN, Bert, Dirk ,  SCHREUDER, André ,  SOETHOUDT, Abraham, Alexander ,  TROMP, Siegfried, Alexander ,  VAN DE VIJVER, Yuri, Johannes, Gabriël

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract translation: 一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体 其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口， 外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

公开(公告)号：WO2018059836A1

公开(公告)日：2018-04-05

申请号：PCT/EP2017/071179

申请日：2017-08-23

Applicant: ASML NETHERLANDS B.V.

Inventor： ACHANTA, Satish ,  WELTERS, Wilhelmus, Jacobus, Johannes ,  SOETHOUDT, Abraham, Alexander ,  KAMMINGA, Jelmer, Mattheüs ,  LIEDECKE, Christian

IPC: G03F7/16 ,  B05D1/18 ,  C23C16/455 ,  H01L21/687

Abstract: The present invention relates to a substrate (100), a substrate holder (200), a substrate coating apparatus (800, 801), a method for coating the substrate (100) and a method for removing the coating (102). A monomolecular layer (102) is applied to the backside (101) of the substrate or a clamp surface (201) of the substrate holder (200). The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force (210). After loading the substrate (100) on the substrate holder (200) full clamping force (210) is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer (102), resulting in an increase of the friction force between the substrate (100) and the substrate holder (200).

Abstract translation: （100），基板保持器（200），基板涂覆设备（800,801），用于涂覆基板（100）的方法和用于去除基板 涂层（102）。 将单分子层（102）施加到衬底的背面（101）或衬底支架（200）的夹持表面（201）。 当衬底没有经历完全夹紧力时，衬底背面和衬底之间的摩擦力很小（210）。 在将衬底（100）装载到衬底保持器（200）上之后，施加完全夹紧力（210）以固定衬底。 夹紧力导致局部去除单分子层（102），导致衬底（100）和衬底支架（200）之间的摩擦力增加。

公开(公告)号：WO2016005117A1

公开(公告)日：2016-01-14

申请号：PCT/EP2015/062504

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： KERSSEMAKERS, Sander ,  DE BOEIJ, Wilhelmus, Petrus ,  DE LANGE, Gerben, Frank ,  HOOGENDAM, Christiaan, Alexander ,  VAN GILS, Petrus, Franciscus ,  KAMMINGA, Jelmer, Mattheüs ,  KUIT, Jan Jaap ,  SCHOORMANS, Carolus, Johannes, Catharina

IPC: G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

Abstract translation: 一种光刻设备，包括支撑结构，该支撑结构构造成在单次扫描操作期间，当在单次扫描操作期间支撑具有第一扫描方向的扫描距离的图案形成装置时，在单次扫描操作期间移动第一扫描距离， 在扫描方向上具有第二范围的图案形成装置以及在单次扫描操作期间被移动第三扫描距离的基板台，当支撑结构支撑具有在扫描方向上具有第一范围的图案形成装置并被移动时 当支撑结构支撑具有在扫描方向上的第二范围的图案形成装置时，在单次扫描操作期间第四扫描距离。