RADIATION SOURCE
    1.
    发明申请
    RADIATION SOURCE 审中-公开

    公开(公告)号:WO2019166164A1

    公开(公告)日:2019-09-06

    申请号:PCT/EP2019/051950

    申请日:2019-01-28

    Abstract: A radiation source (SO) of a laser-produced plasma type is described. The radiation source (SO) comprises a droplet generator (3a) configured to provide a fuel droplet (60). The radiation source (SO) comprises a laser system (1) configured to provide a pre-pulse and a main-pulse. The pre-pulse is operative to condition the fuel droplet (60) for receipt of main pulse. The main pulse is operative to convert the conditioned fuel droplet (60) into plasma. The radiation source (SO) comprises a sensing system (16) configured for sensing a characteristic of an oscillation of a spatial mass distribution of the fuel droplet (60). The radiation source (SO) comprises a control system (44) operative to adjust a polarization of the pre-pulse under control of the sensed characteristic. The polarization of the pre- pulse may affect the spatial mass distribution of the conditioned fuel droplet (60).

    MEMBRANE CLEANING APPARATUS
    3.
    发明申请

    公开(公告)号:WO2021073799A1

    公开(公告)日:2021-04-22

    申请号:PCT/EP2020/073669

    申请日:2020-08-25

    Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support for supporting the membrane; and a pressure pulse generating mechanism including one or more laser energy sources configured to generate a pressure pulse in a gas. The one or more energy laser sources may be focused to generate a pressure pulse in a gaseous atmosphere. The pressure pulse serves to dislodge particles on the membrane.

Patent Agency Ranking