公开(公告)号：WO2022263104A1

公开(公告)日：2022-12-22

申请号：PCT/EP2022/063752

申请日：2022-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： PU, Lingling ,  LIN, Yuzhang ,  WANG, Teng ,  WANG, Bo ,  LA GRECA, Raphael, Eric ,  HUNSCHE, Stefan

IPC: G03F7/20 ,  G06T7/12

Abstract: To monitor semiconductor manufacturing process variation, contours of identical pattern features are determined based on SEM images, and the contours are aggregated and statistically analyzed to determine the variation of the feature. Some of the contours are outliers, and the aggregation and averaging of the contours "hides" these outliers. The present disclosure describes filtering certain outlier contours before they are aggregated and statistically analyzed. The filtering can be performed at multiple levels, such as based on individual points on the contours in the set of inspection contours, or based on overall geometrical shapes of the contours in the set of inspection contours.