公开(公告)号：WO2021224435A1

公开(公告)日：2021-11-11

申请号：PCT/EP2021/062087

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Wei ,  FEI, Ruochong ,  PU, Lingling ,  ZHOU, Wentian ,  YU, Liangjiang ,  WANG, Bo

IPC: G06T5/00 ,  G06T5/20 ,  G06T5/50

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.

公开(公告)号：WO2022263104A1

公开(公告)日：2022-12-22

申请号：PCT/EP2022/063752

申请日：2022-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： PU, Lingling ,  LIN, Yuzhang ,  WANG, Teng ,  WANG, Bo ,  LA GRECA, Raphael, Eric ,  HUNSCHE, Stefan

IPC: G03F7/20 ,  G06T7/12

Abstract: To monitor semiconductor manufacturing process variation, contours of identical pattern features are determined based on SEM images, and the contours are aggregated and statistically analyzed to determine the variation of the feature. Some of the contours are outliers, and the aggregation and averaging of the contours "hides" these outliers. The present disclosure describes filtering certain outlier contours before they are aggregated and statistically analyzed. The filtering can be performed at multiple levels, such as based on individual points on the contours in the set of inspection contours, or based on overall geometrical shapes of the contours in the set of inspection contours.

公开(公告)号：WO2021028366A1

公开(公告)日：2021-02-18

申请号：PCT/EP2020/072332

申请日：2020-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Wei ,  PU, Lingling ,  WANG, Bo ,  DONG, Zhonghua ,  WANG, Yongxin

IPC: H01J37/22

Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged- particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.