公开(公告)号：WO2020043525A1

公开(公告)日：2020-03-05

申请号：PCT/EP2019/072105

申请日：2019-08-19

Applicant: ASML NETHERLANDS B.V.

Inventor： PU, Lingling ,  FANG, Wei ,  ZHAO, Nan ,  ZHOU, Wentian ,  WANG, Teng ,  XU, Ming

IPC: G03F7/20 ,  G03F1/86

Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.

公开(公告)号：WO2022263104A1

公开(公告)日：2022-12-22

申请号：PCT/EP2022/063752

申请日：2022-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： PU, Lingling ,  LIN, Yuzhang ,  WANG, Teng ,  WANG, Bo ,  LA GRECA, Raphael, Eric ,  HUNSCHE, Stefan

IPC: G03F7/20 ,  G06T7/12

Abstract: To monitor semiconductor manufacturing process variation, contours of identical pattern features are determined based on SEM images, and the contours are aggregated and statistically analyzed to determine the variation of the feature. Some of the contours are outliers, and the aggregation and averaging of the contours "hides" these outliers. The present disclosure describes filtering certain outlier contours before they are aggregated and statistically analyzed. The filtering can be performed at multiple levels, such as based on individual points on the contours in the set of inspection contours, or based on overall geometrical shapes of the contours in the set of inspection contours.

公开(公告)号：WO2020141072A1

公开(公告)日：2020-07-09

申请号：PCT/EP2019/085720

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Wentian ,  YU, Liangjiang ,  WANG, Teng ,  PU, Lingling ,  FANG, Wei

IPC: G06K9/03 ,  G06K9/62

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.