DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS
    1.
    发明申请
    DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    用于光刻设备,EUV源和光刻设备的液滴生成器

    公开(公告)号:WO2017102931A1

    公开(公告)日:2017-06-22

    申请号:PCT/EP2016/081161

    申请日:2016-12-15

    CPC classification number: G03F7/70033 H05G2/006

    Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

    Abstract translation: 诸如在EUV辐射源中使用的液滴发生器,以及相关联的EUV辐射源和光刻设备。 液滴发生器可以包括喷嘴组件以喷射作为液滴的燃料,喷嘴组件处于与液滴发生器内的燃料压力基本相同的压力下的加压环境内。 液滴发生器可以包括致动器,该致动器通过偏置机构与泵室接触并且偏置抵靠泵室,该偏置机构具有偏置抵靠致动器的致动器支撑件。 致动器作用于泵室内的燃料以产生液滴。 致动器支撑件具有比其周围结构具有更大热膨胀系数的材料,使得其可在环境温度下在周围结构内移动,但在工作温度下相对于周围结构膨胀,从而将致动器支撑件夹紧 在工作温度下的周围结构。

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