APPARATUS FOR CONTROLLING INTRODUCTION OF EUV TARGET MATERIAL INTO AN EUV CHAMBER

    公开(公告)号:WO2020141057A1

    公开(公告)日:2020-07-09

    申请号:PCT/EP2019/085023

    申请日:2019-12-13

    Abstract: Apparatus for controlling introduction of EUV target material into an EUV chamber in which a flow restrictor orifice is placed in a flow path of target material through the droplet generator, for example, at a position upstream of a filter within the droplet generator. Also, a liquid tin sensor, for example, a conduction probe or electrical load detector, which may be located in the volume of a droplet generator heater blocks. The flow restrictor can be configured to serve additionally as a seal, for example, for the filter. Thus, the flow restrictor can be configured as a metal disk that can also serve as a sealing gasket. For example, the metal may be unannealed tantalum, tantalum-tungsten alloy, annealed molybdenum, molybdenumrhenium alloy, or annealed rhenium.

    TARGET DELIVERY SYSTEM
    2.
    发明申请

    公开(公告)号:WO2020148155A1

    公开(公告)日:2020-07-23

    申请号:PCT/EP2020/050411

    申请日:2020-01-09

    Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

    DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS
    3.
    发明申请
    DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    用于光刻设备,EUV源和光刻设备的液滴生成器

    公开(公告)号:WO2017102931A1

    公开(公告)日:2017-06-22

    申请号:PCT/EP2016/081161

    申请日:2016-12-15

    CPC classification number: G03F7/70033 H05G2/006

    Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

    Abstract translation: 诸如在EUV辐射源中使用的液滴发生器,以及相关联的EUV辐射源和光刻设备。 液滴发生器可以包括喷嘴组件以喷射作为液滴的燃料,喷嘴组件处于与液滴发生器内的燃料压力基本相同的压力下的加压环境内。 液滴发生器可以包括致动器,该致动器通过偏置机构与泵室接触并且偏置抵靠泵室,该偏置机构具有偏置抵靠致动器的致动器支撑件。 致动器作用于泵室内的燃料以产生液滴。 致动器支撑件具有比其周围结构具有更大热膨胀系数的材料,使得其可在环境温度下在周围结构内移动,但在工作温度下相对于周围结构膨胀,从而将致动器支撑件夹紧 在工作温度下的周围结构。

Patent Agency Ranking