公开(公告)号：WO2017092936A1

公开(公告)日：2017-06-08

申请号：PCT/EP2016/075913

申请日：2016-10-27

Applicant: ASML NETHERLANDS B.V.

Inventor： SANCHEZ-FABRES COBALEDA, Cayetano ,  BIJNEN, Franciscus, Godefridus, Casper ,  HULSEBOS, Edo, Maria ,  DEN BOEF, Arie, Jeffrey ,  BEEMS, Marcel, Hendrikus, Maria ,  STOLARZ, Piotr, Michal

IPC: G03F9/00

CPC classification number: G03F9/7011

Abstract: A lithographic apparatus has a substrate table on which a substrate is positioned, and an alignment sensor used to measure the alignment of the substrate. In an exemplary processing method, the alignment sensor is used to perform one or more edge measurements in a first step. In a second step, one or more edge measurements are performed on the notch of the substrate. The edge measurements are then used to align the substrate in the lithographic apparatus. In a particular example, the substrate is arranged relative to the alignment sensor such that a portion of the edge surface is positioned at the focal length of the lens. When the alignment sensor detects radiation scattered by the edge surface at the focal length of the lens, the presence of the edge of the substrate is detected.

Abstract translation: 光刻设备具有其上放置有基板的基板台和用于测量基板的对准的对准传感器。 在示例性处理方法中，对准传感器用于在第一步骤中执行一个或多个边缘测量。 在第二步中，在基板的凹槽上执行一个或多个边缘测量。 然后使用边缘测量值来对准光刻设备中的衬底。 在特定示例中，衬底相对于对准传感器布置，使得边缘表面的一部分位于透镜的焦距处。 当对准传感器检测到在透镜的焦距处由边缘表面散射的辐射时，检测到衬底边缘的存在。