公开(公告)号：WO2017021299A1

公开(公告)日：2017-02-09

申请号：PCT/EP2016/068164

申请日：2016-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  VAN LEEUWEN, Robbert, Edgar

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02061 ,  G01B11/026 ,  G01B11/26

Abstract: There is provided a position measurement system (200) comprising an object (202) having a reflective surface (204), and an interferometer (206) for determining a position of the object. The reflective surface has a first area (210a), a second area (210b) and a third area (210c). The interferometer is arranged to generate a first signal representative of the position by irradiating the first area. The interferometer is arranged to generate a second signal representative of the position by irradiating the second area. The interferometer is arranged to generate a third signal representative of the position by irradiating the third area. Along a line (212), the first area and the second area are at a first distance (214a) relative to each other. Along the line, the second area and the third area are at a second distance (214b) relative to each other. Along the line, the first area and the third area are at a third distance (214c) relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first signal, the second signal and the third signal. The axis is parallel to the reflective surface and perpendicular to the line.

Abstract translation: 提供了一种包括具有反射表面（204）的对象（202）和用于确定对象位置的干涉仪（206）的位置测量系统（200）。 反射面具有第一区域（210a），第二区域（210b）和第三区域（210c）。 干涉仪布置成通过照射第一区域来产生表示位置的第一信号。 干涉仪布置成通过照射第二区域来产生表示位置的第二信号。 干涉仪布置成通过照射第三区域来产生表示位置的第三信号。 沿着线（212），第一区域和第二区域相对于彼此处于第一距离（214a）。 沿线，第二区域和第三区域相对于彼此处于第二距离（214b）。 沿着该线，第一区域和第三区域相对于彼此处于第三距离（214c）。 所述干涉仪布置成基于所述第一信号，所述第二信号和所述第三信号，沿着轴提供表示所述物体的旋转的旋转信号。 轴平行于反射面并垂直于线。

公开(公告)号：WO2017001124A1

公开(公告)日：2017-01-05

申请号：PCT/EP2016/061901

申请日：2016-05-26

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  EUSSEN, Emiel, Jozef, Melanie ,  VAN LEEUWEN, Robbert, Edgar

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02018 ,  G01B9/02027

Abstract: The invention relates to a position measurement system to measure a position of an object (OB) relative to a reference, comprising two interferometers (IF1, IF2), wherein each interferometer is configured to form a reference beam (40) and a measurement beam (20) from input radiation (10) and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector (SD), wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element (RE1, RE2), and such that the measurement beam is formed by diffraction of input radiation from a grating (GR) on the object, and wherein the reference beam and the measurement beam are parallel to each other.

Abstract translation: 本发明涉及一种位置测量系统，用于测量物体（OB）相对于参考物的位置，包括两个干涉仪（IF1，IF2），其中每个干涉仪被配置成形成参考光束（40）和测量光束 20），并且组合参考光束和测量光束以提供要传送到检测器（SD）的输出辐射，其中每个干涉仪被配置为使得参考光束通过来自 反射元件（RE1，RE2），并且使得测量光束通过衍射来自物体上的光栅（GR）的输入辐射而形成，并且其中参考光束和测量光束彼此平行。

公开(公告)号：WO2020083624A1

公开(公告)日：2020-04-30

申请号：PCT/EP2019/076832

申请日：2019-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LEEUWEN, Robbert, Edgar ,  ABDOLVAND, Amir

IPC: C03B37/012 ,  C03C25/68 ,  G03F7/20

Abstract: An optical fiber, manufacturing intermediate for forming an optical fiber and a method for forming an optical fiber. The method comprises providing a manufacturing intermediate (300) having an elongate body and comprising an outer tube (308) and a plurality of inner tubes (304), the plurality of inner tubes being arranged in the outer tube, the plurality of inner tubes being arranged in one or more ring structures around, and at least partially defining, an aperture (302) extending through the elongate body along an axial dimension of the elongate body, a boundary of the aperture defining an internal surface of the manufacturing intermediate. The method further comprises etching the internal surface of the manufacturing intermediate using an etching substance, and drawing the manufacturing intermediate along the axial dimension so as to form the optical fiber.

公开(公告)号：WO2019048198A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/072048

申请日：2018-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  VAN LEEUWEN, Robbert, Edgar

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system for projecting the patterned radiation beam onto a target portion of the substrate, and a wavelength modulator configured to vary a wavelength of the radiation beam across the cross-section of the radiation beam.

公开(公告)号：WO2017144236A1

公开(公告)日：2017-08-31

申请号：PCT/EP2017/051877

申请日：2017-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LEEUWEN, Robbert, Edgar ,  BUTLER, Hans

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/7085 ,  G01B9/02015 ,  G01B9/02049 ,  G03F7/70733 ,  G03F7/70758 ,  G03F7/70775

Abstract: An actuator system (AS) is configured to position an object (OJ), the actuator system comprises a piezo actuator (PA) comprising an actuator contact surface (ACS). The piezo actuator is configured to exert a force (F) via the actuator contact surface onto the object. The actuator system further comprises an optical position sensor (OPS) configured to measure a position of the actuator contact surface. The piezo actuator comprises a transparent piezo material. The optical position sensor is configured to transmit an optical beam (OB) through the transparent piezo material to the actuator contact surface. The transparent piezo material may be LJNB03. The optical position sensor may form an interferometer.

Abstract translation: 致动器系统（AS）被配置为定位物体（OJ），致动器系统包括包括致动器接触表面（ACS）的压电致动器（PA）。 压电致动器构造成经由致动器接触表面施加力（F）到物体上。 致动器系统还包括配置成测量致动器接触表面的位置的光学位置传感器（OPS）。 压电致动器包括透明的压电材料。 该光学位置传感器被配置为通过透明压电材料将光束（OB）传输到致动器接触表面。 透明压电材料可以是LJNB03。 光学位置传感器可以形成干涉仪。