公开(公告)号：WO2020136094A3

公开(公告)日：2020-07-02

申请号：PCT/EP2019/086459

申请日：2019-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LUO, Ying ,  DONG, Zhonghua ,  YIN, Xuehui ,  DI, Long ,  DENG, Nianpei ,  FANG, Wei ,  PU, Lingling ,  FEI, Ruochong ,  ZHU, Bohang ,  LIU, Yu

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: A charged-particle beam system (300) is disclosed. The charged- particle beam system comprises a stage (201) configured to hold a sample (203) and is movable in at least one of X-Y-Z axes. The charged-particle beam system further comprises a position sensing system (350,340) to determine a lateral and vertical displacement of the stage, and a beam deflection controller (367) configured to apply a first signal to deflect a primary charged-particle beam (330) incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively. Further, a non-transitory computer readable medium is disclosed, comprising a set of instructions for causing an apparatus (300) to perform a method, the apparatus including a charged-particle source (310) to generate a primary charged-particle beam (314,330), the method comprising determining a lateral displacement of a stage (201), wherein the stage is movable in at least one of X-Y axes; and instructing a controller (367) to apply a first signal to deflect the primary charged-particle beam incident on a sample (203) to at least partly compensate for the lateral displacement

公开(公告)号：WO2020136094A2

公开(公告)日：2020-07-02

申请号：PCT/EP2019/086459

申请日：2019-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LUO, Ying ,  DONG, Zhonghua ,  YIN, Xuehui ,  DI, Long ,  DENG, Nianpei ,  FANG, Wei ,  PU, Lingling ,  FEI, Ruochong ,  ZHU, Bohang ,  LIU, Yu

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 k Hz to 50 k Hz, and 50 k Hz to 200 k Hz, respectively.

公开(公告)号：WO2020126963A1

公开(公告)日：2020-06-25

申请号：PCT/EP2019/085233

申请日：2019-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER TOORN, Jan-Gerard, Cornelis ,  HUINCK, Jeroen, Gertruda, Antonius ,  SEVERT, Han, Willem, Hendrik ,  KOOIKER, Allard, Eelco ,  RONDE, Michaël, Johannes, Christiaan ,  WELLINK, Arno, Maria ,  LIU, Shibing ,  LUO, Ying ,  WANG, Yixiang ,  CHEN, Chia-Yao ,  ZHU, Bohang ,  VAN SOEST, Jurgen

IPC: G03F7/20 ,  H01J37/00 ,  H01J37/20

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.