公开(公告)号：WO2021180496A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/054983

申请日：2021-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOEST, Jurgen ,  VAN DER KROON, Boudewijn, Weijert, Herman, Jan ,  TEUNISSEN, Christan ,  OTTEN, Christiaan

IPC: H01J37/09 ,  H01J37/04

Abstract: Disclosed herein is an aperture body (500) for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an up-beam facing surface (510); a chamber portion (511) comprising an up-beam end, a down-beam end and an up-beam plate (509), wherein the up-beam plate extends radially inwards from the up-beam end and the up-beam plate is configured to define an entrance opening (501) around the beam path; wherein: the up-beam facing surface extends radially inwards from the down-beam end; the up-beam facing surface comprises an aperture portion (504) that is configured to define an opening around the beam path; and the opening defined by the aperture portion is smaller than the entrance opening.

公开(公告)号：WO2022048898A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072716

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：WO2022013368A1

公开(公告)日：2022-01-20

申请号：PCT/EP2021/069785

申请日：2021-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOEST, Jurgen

IPC: H01J37/075 ,  H01J3/02 ,  H01J37/073 ,  H01J1/14 ,  H01J1/304

Abstract: An emitter is configured to emit charged particles. The emitter comprises a body, a metal layer and a charged particle source layer. The body has a point. The metal layer is of a first metal on at least the point. The charged particle source layer is on the metal layer. The point comprises a second metal other than the first metal.

公开(公告)号：WO2020126963A1

公开(公告)日：2020-06-25

申请号：PCT/EP2019/085233

申请日：2019-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER TOORN, Jan-Gerard, Cornelis ,  HUINCK, Jeroen, Gertruda, Antonius ,  SEVERT, Han, Willem, Hendrik ,  KOOIKER, Allard, Eelco ,  RONDE, Michaël, Johannes, Christiaan ,  WELLINK, Arno, Maria ,  LIU, Shibing ,  LUO, Ying ,  WANG, Yixiang ,  CHEN, Chia-Yao ,  ZHU, Bohang ,  VAN SOEST, Jurgen

IPC: G03F7/20 ,  H01J37/00 ,  H01J37/20

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：WO2022058120A2

公开(公告)日：2022-03-24

申请号：PCT/EP2021/073051

申请日：2021-08-19

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER KROON, Boudewijn, Weijert, Herman, Jan ,  VAN SOEST, Jurgen

IPC: H01J37/248 ,  H01R13/53 ,  H01R13/533

Abstract: Disclosed herein is a connector (401) for electrically connecting a feedthrough (411) of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly (405+406) configured to be in electrical connection with a high voltage power source, the wire assembly comprising a plug for receiving the end of a feedthrough pin (408); and a connector insulator (402) comprising a channel (407) configured to extend into the connector insulator and to receive the feedthrough pin so as to electrically connect the connector wire assembly with the feedthrough pin; wherein the connector insulator is configured to engage with the feedthrough so that a boundary surface of the connector insulator extends substantially bi-directionally in the direction of the longitudinal axis of the channel, the boundary surface substantially extending into the connector insulator.

公开(公告)号：WO2022258271A1

公开(公告)日：2022-12-15

申请号：PCT/EP2022/062443

申请日：2022-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOEST, Jurgen ,  VEENSTRA, Roy, Ramon ,  SMAKMAN, Erwin, Paul ,  VAN ZUTPHEN, Tom ,  MANGNUS, Albertus, Victor, Gerardus

IPC: H01J37/073

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：WO2022135926A1

公开(公告)日：2022-06-30

申请号：PCT/EP2021/084737

申请日：2021-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： STEENBRINK, Stijn, Wilem, Herman, Karel ,  KONING, Johan, Joost ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/12 ,  H01J37/28

Abstract: Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.

公开(公告)号：WO2021190977A1

公开(公告)日：2021-09-30

申请号：PCT/EP2021/056521

申请日：2021-03-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOEST, Jurgen ,  BERGLUND, Gun Sara Mari ,  HUANG FOEN CHUNG, Robert Wong Joek Meu ,  MARTINEZ NEGRETE GASQUE, Diego ,  DINU GURTLER, Laura

IPC: H01J37/02 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/061 ,  H01J2237/2817 ,  H01J37/026

Abstract: A charged particle apparatus for projecting a charged particle multi- beam to a sample, the apparatus comprising a primary column configured to generate a primary beam towards a sample, and a flood column for charged particle flooding of the sample. The flood column comprises a charged particle source (301) configured to emit a charged particle beam along a beam path; a source lens (310) arranged down-beam of the charged particle source; a condenser lens (320) arranged down-beam of the source lens; and an aperture body (350) arranged down-beam of the condenser lens, wherein the aperture body is for passing a portion of the charged particle beam; and wherein the source lens is controllable so as to variably set the beam angle of the charged particle beam down-beam of the source lens.