公开(公告)号：WO2017162462A1

公开(公告)日：2017-09-28

申请号：PCT/EP2017/055826

申请日：2017-03-13

Applicant: BASF SE

Inventor： LAUTER, Michael ,  GUEVENC, Haci Osman ,  SIEBERT, Max ,  LAN, Yongqing ,  USMAN IBRAHIM, Sheik Ansar ,  GOLZARIAN, Reza M. ,  WEI, Te Yu

IPC: C09G1/04

Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a poly(amino acid) and or a salt thereof (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.

Abstract translation: 化学机械抛光（CMP）组合物（Q）用于包含（i）钴和/或（ii）钴合金的基材（S）的化学机械抛光的用途，其中所述CMP组合物 （Q）包含（A）无机颗粒（B），聚氨基酸和/或其盐（C）至少一种氨基酸，（D）至少一种氧化剂（E），水性介质，并且其中所述CMP组合物 （Q）的pH值为7-10。

公开(公告)号：WO2017025536A1

公开(公告)日：2017-02-16

申请号：PCT/EP2016/068964

申请日：2016-08-09

Applicant: BASF SE

Inventor： REICHARDT, Robert ,  SIEBERT, Max ,  LAN, Yongqing ,  LAUTER, Michael ,  USMAN IBRAHIM, Sheik Ansar ,  GOLZARIAN, Reza M. ,  WEI, Te Yu ,  GUEVENC, Haci Osman ,  PROELSS, Julian ,  LEUNISSEN, Leonardus

IPC: C09G1/02

CPC classification number: C09G1/02

Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and /or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer ≥ 1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.

Abstract translation: 使用化学机械抛光（CMP）组合物（Q）用于包括（i）钴和/或（ii）钴合金和（iii）TiN和/或TaN的基底（S）的化学机械抛光，其中 CMP组合物（Q）包含（E）无机颗粒（F）至少一种包含氨基和酸基（Y）的有机化合物，其中所述化合物包含n个氨基和至少n + 1个酸性质子，其中n （G）至少一种氧化剂，其量相对于相应的CMP组合物的总重量为0.2至2.5重量％，（H）其中CMP组合物（Q）具有的水性介质 pH大于6且小于9。