公开(公告)号：WO2004032722A3

公开(公告)日：2005-03-24

申请号：PCT/US0332259

申请日：2003-10-08

Applicant: BECHTEL BWXT IDAHO LLC

Inventor： DEASON VANCE A ,  TELSCHOW KENNETH L

IPC: A61B20060101 ,  G01B9/02 ,  G01B9/04 ,  G01B11/02 ,  G01H9/00 ,  G01J9/02

CPC classification number: G01H9/002 ,  G01B9/04 ,  G01H9/00 ,  G01J2009/0265

Abstract: An imaging system includes: an object wavefront source (12) and an optical microscope objective (4) all positioned to direct an object wavefront onto an area of a vibrating subject (6) surface encompassed by a field of view of the microscope objective (4), and to direct a modulated object wavefront reflected from the encompassed surface area through a photorefractive material (XTAL); and a reference wavefront source (12) and at least one phase modulator (MOD) all positioned to direct a reference wavefront through the phase modulator (MOD) and to direct a modulated reference wavefront from the phase modulator (MOD) through the photorefractive material (XTAL) to interfere with the modulated object wavefront. The photorefractive material (XTAL) has a composition and a position such that interference of the modulated object wavefront and modulated reference wavefront occurs within the photorefractive material, (XTAL) providing a full-field, real-time image signal of the encompassed surface area (6).

Abstract translation: 一种成像系统包括：物体波前源（12）和光学显微镜物镜（4），其全部定位成将物体波前引导到由显微镜物镜（4）的视场所包围的振动对象（6）表面的区域 ），并且通过光折射材料（XTAL）引导从包围的表面区域反射的被调制物体波前; 以及参考波前源（12）和至少一个相位调制器（MOD），所述至少一个相位调制器（MOD）全部定位成将参考波前引导通过相位调制器（MOD）并且通过光折射材料（MOD）将调制的参考波阵面从相位调制器 XTAL）干扰调制对象波前。 光折射材料（XTAL）具有组成和位置，使得调制对象波前和调制参考波阵面的干涉发生在光折射材料内，（XTAL）提供包围表面积的全场实时图像信号 6）。

公开(公告)号：WO2004034079A3

公开(公告)日：2004-12-23

申请号：PCT/US0332068

申请日：2003-10-08

Applicant: BECHTEL BWXT IDAHO LLC

Inventor： DEASON VANCE A ,  TELSCHOW KENNETH L

IPC: G01B9/02 ,  G01B11/02 ,  G01N29/06 ,  G01N29/30 ,  G01S20060101 ,  G01S15/89

CPC classification number: G01N29/0681 ,  G01N29/30 ,  G01S15/8906

Abstract: An inspection system calibration method includes producing two sideband signals of a first wavefront; interfering the two sideband signals in a photorefractive material, producing an output signal therefrom having a frequency and a magnitude; and producing a phase modulated operational signal having a frequency different from the output signal frequency, a magnitude, and a phase modulation amplitude. The method includes determining a ratio of the operational signal magnitude to the output signal magnitude, determining a ratio of a 1st order Bessel function of the operational signal phase modulation amplitude to a 0th order Bessel function of the operational signal phase modulation amplitude, and comparing the magnitude ratio to the Bessel function ratio.

Abstract translation: 检测系统校准方法包括：产生第一波前的两个边带信号; 干涉光折射材料中的两个边带信号，从而产生具有频率和大小的输出信号; 并产生具有与输出信号频率，幅度和相位调制幅度不同的频率的相位调制操作信号。 该方法包括确定操作信号幅度与输出信号幅度的比率，确定操作信号相位调制幅度的1阶贝塞尔函数与操作信号相位调制幅度的0阶贝塞尔函数的比率， 幅度比与贝塞尔函数比。