SYSTEM AND METHOD FOR DETERMINING YEAST CELL VIABILITY AND CONCENTRATION
    1.
    发明申请
    SYSTEM AND METHOD FOR DETERMINING YEAST CELL VIABILITY AND CONCENTRATION 审中-公开
    确定酵母细胞生存能力和浓度的系统和方法

    公开(公告)号:WO2018057972A1

    公开(公告)日:2018-03-29

    申请号:PCT/US2017/053079

    申请日:2017-09-22

    Abstract: A lens-free microscope system for automatically analyzing yeast cell viability in a stained sample includes a portable, lens-free microscopy device that includes a housing containing a light source coupled to an optical fiber, the optical fiber spaced away several centimeters from an image sensor disposed at one end of the housing, wherein the stained sample is disposed on the image sensor or a sample holder adjacent to the image sensor. Hologram images are transferred to a computing device having image processing software contained therein, the image processing software identifying yeast cell candidates of interest from back-propagated images of the stained sample, whereby a plurality of spatial features are extracted from the yeast cell candidates of interest and subject to a trained machine learning model to classify the yeast cell candidates of interest as live or dead.

    Abstract translation: 用于自动分析染色样品中酵母细胞活力的无镜头显微镜系统包括便携式无镜头显微镜装置,其包括含有耦合到光纤的光源的外壳,光纤 与设置在壳体的一端的图像传感器间隔几厘米,其中被染色的样本被设置在图像传感器或与图像传感器相邻的样本架上。 全息图像被转移到其中包含图像处理软件的计算设备,图像处理软件从染色样品的反向传播图像中识别感兴趣的酵母细胞候选,从而从感兴趣的酵母细胞候选提取多个空间特征 并且受到训练的机器学习模型的影响,以将感兴趣的酵母细胞候选分类为活或死。

    A TECHNIQUE FOR ILLUMINATING A SAMPLE TO BE INSPECTED BY INTERFEROMETRIC MICROSCOPY
    2.
    发明申请
    A TECHNIQUE FOR ILLUMINATING A SAMPLE TO BE INSPECTED BY INTERFEROMETRIC MICROSCOPY 审中-公开
    用于通过干涉显微镜检查样品的技术

    公开(公告)号:WO2017041843A1

    公开(公告)日:2017-03-16

    申请号:PCT/EP2015/070630

    申请日:2015-09-09

    CPC classification number: G02B21/08 G01B9/04 G02B21/14

    Abstract: A condenser lens, and an interferometric microscopy arrangement based on the condenser lens and a method based on the condenser lens are presented. The condenser lens shines a light beam from an illumination source onto a sample that is to be inspected by an interferometric microscopy device. The light beam from the illumination source has a first wavefront. The condenser lens includes a non-condensing region and a condensing region. The non-condensing region receives a first part of the light beam from the illumination source and transmits the first part towards the sample. The first part of the light beam so transmitted has the first wavefront. The condensing region receives a second part of the light beam from the illumination source and transmits the second part towards the sample. The second part of the light beam so transmitted has a second wavefront. The first wavefront is different from the second wavefront.

    Abstract translation: 提出了一种聚光透镜,以及基于聚光透镜的干涉式显微镜装置以及基于聚光透镜的方法。 聚光镜将来自照明源的光束照射到由干涉式显微镜装置检查的样品上。 来自照明源的光束具有第一波前。 聚光透镜包括非冷凝区域和冷凝区域。 非冷凝区域接收来自照明源的光束的第一部分,并将第一部分朝向样品传送。 所传输的光束的第一部分具有第一波前。 聚光区域接收来自照明源的光束的第二部分,并将第二部分透射到样品。 所传输的光束的第二部分具有第二波前。 第一个波前与第二个波阵面不同。

    СПОСОБ ОПРЕДЕЛЕНИЯ ПАРАМЕТРОВ ОБЪЕКТА И УСТРОЙСТВО ДЛЯ ЕГО РЕАЛИЗАЦИИ (ВАРИАНТЫ)
    3.
    发明申请
    СПОСОБ ОПРЕДЕЛЕНИЯ ПАРАМЕТРОВ ОБЪЕКТА И УСТРОЙСТВО ДЛЯ ЕГО РЕАЛИЗАЦИИ (ВАРИАНТЫ) 审中-公开
    用于定义对象的参数的方法,以及用于执行所述方法(变量)的装置

    公开(公告)号:WO2016108805A1

    公开(公告)日:2016-07-07

    申请号:PCT/UA2015/000123

    申请日:2015-12-11

    CPC classification number: G01B9/04 G01B11/30

    Abstract: Способ определения параметров объекта и устройство для его реализации (варианты) путем непосредственного измерения фазы переменной составляющей фототока с частотой Δf между частотными параметрами каждого из пары разнесенных по частоте и в пространстве и отраженных от поверхности исследуемого объекта (или прошедших сквозь него) сканирующих световых пучков и воссоздания изображения рельефа поверхности исследуемого объекта или построения его «карты рефракции» (распределение плотности), который относится к способам и средствам, использующим методы дифференциально-фазовой профилометрии/профилографии и оптической рефрактометрии и может быть использован практически во всех отраслях промышленности - в автомобильной, авиационной, авиакосмической, химической, электронной, оптической и медицинской промышленности, в машиностроении при изготовлении различных деталей, агрегатов и машин, высокоэффективных турбосистем, в приборостроении, особенно в производстве подшипников, а также для определения эксплуатационных параметров топливно-смазочных материалов, например, для экспресс-анализа с целью определения количества и размеров частиц в маслах, топливе и нефтепродуктах, в прозрачных веществах и биологических средах.

    Abstract translation: 一种用于通过直接测量一对扫描中的每一个的频率参数之间的频率Δf的光电流的可变分量的相位来实现所述方法(变型)来定义对象和装置的参数的方法 光束通过频率和空间间隔开并被从正在研究的物体的表面(或已经通过所述物体)反射,并且重建正被研究的物体的表面浮雕或构造一个 “折射图”(密度分布)相同; 所述方法涉及使用微分相轮廓测量/轮廓测量和光学折射法的方法和手段,可用于几乎所有行业分支:机动车辆,航空航天,化工,电子,光学和医疗行业; 在制造各种零件,集料和机器以及高效涡轮增压系统时的机械制造; 在制造仪器上,特别是在生产轴承方面; 并且还用于限定可燃和润滑材料的操作参数,例如用于快速分析,以确定油,燃料和石油产品中的颗粒在透明物质和生物介质中的数量和尺寸。

    SYSTEM, METHOD, AND DEVICE FOR DETERMINING A FOCAL POSITION OF AN OBJECTIVE IN A MICROSCOPY IMAGING SYSTEM
    4.
    发明申请
    SYSTEM, METHOD, AND DEVICE FOR DETERMINING A FOCAL POSITION OF AN OBJECTIVE IN A MICROSCOPY IMAGING SYSTEM 审中-公开
    用于确定微观成像系统中目标的焦点位置的系统,方法和装置

    公开(公告)号:WO2013184817A1

    公开(公告)日:2013-12-12

    申请号:PCT/US2013/044334

    申请日:2013-06-05

    Inventor: COHEN, Avrum I.

    CPC classification number: G01M11/0228 G01B9/04 G02B21/006 G02B21/245 G06F19/10

    Abstract: A system and method of determining a focal position for an objective positioned at a measurement location of a sample holder in a microscopy imaging system are provided. The objective is moved to a position relative to the sample holder that corresponds to a distance between the objective and the sample holder. The sample holder has a conditioned upper surface. A focusing light beam is projected onto the sample holder when the objective is located at the position, and the objective focuses the focusing light beam on the sample holder. A reflected light beam resulting from reflection of the focusing light beam off the conditioned upper surface is observed. The focal position for the objective is determined based on the reflected light beam such that the objective produces an in focus image of a microscopy sample when the objective is located at the focal position.

    Abstract translation: 提供了一种用于确定位于显微镜成像系统中的样品架的测量位置处的物镜的焦点位置的系统和方法。 将物镜移动到相对于样品架的位置,该位置对应于物镜与样品架之间的距离。 样品架具有调节的上表面。 当物镜位于该位置时,聚焦光束投影到样品架上,并且物镜将聚焦光束聚焦在样品架上。 观察到由聚焦光束从调节的上表面反射而产生的反射光束。 基于反射光束确定目标的焦点位置,使得当物镜位于焦点位置时,物镜产生显微镜样本的聚焦图像。

    PROCEDIMIENTO Y SISTEMA PARA LA OBTENCIÓN DE IMÁGENES CUANTITATIVAS EN MICROSCOPÍA ÓPTICA DE FASE
    5.
    发明申请
    PROCEDIMIENTO Y SISTEMA PARA LA OBTENCIÓN DE IMÁGENES CUANTITATIVAS EN MICROSCOPÍA ÓPTICA DE FASE 审中-公开
    用于生产光学相位显微镜中定量图像的方法和系统

    公开(公告)号:WO2012117139A1

    公开(公告)日:2012-09-07

    申请号:PCT/ES2012/070116

    申请日:2012-02-27

    CPC classification number: G01B9/04 G02B21/14

    Abstract: Procedimiento para la obtención de imágenes de muestras en microscopía óptica que permite obtener imágenes con información completa cuantitativa de fase o diferencia de camino óptico de muestras (M) microscópicas mediante la generación de imágenes simultaneas de gradiente de fase. La luz emergente de la muestra, iluminada por una diversidad de ondas planas, se divide en cuatro haces mediante el uso de medios ópticos o electro- ópticos. Simultáneamente se genera la imagen de la muestra con los cuatro haces sobre un sensor matricial. Las imágenes están directamente relacionadas con el gradiente. Un algoritmo de integración numérica obtiene la fase a partir de la información de gradiente. De utilidad especial como técnica de microscopia en biología y biomedicina.

    Abstract translation: 本发明涉及一种用于从光学显微镜中的样品产生图像的方法,其使得可以通过产生同步相位梯度图像来产生具有完整的定量相位信息或微观样品(M)的光程差的图像。 由各种平面波照射的样品出现的光线通过光学或电光学手段分为四个束。 具有四个束的样本的图像在矩阵传感器上同时生成。 图像与渐变直接相关。 使用数值积分算法从梯度信息产生相位。 本发明特别可用作生物学和生物医学中的显微技术。

    HIGH-RESOLUTION SURFACE PLASMON MICROSCOPE THAT INCLUDES A HETERODYNE FIBER INTERFEROMETER
    6.
    发明申请
    HIGH-RESOLUTION SURFACE PLASMON MICROSCOPE THAT INCLUDES A HETERODYNE FIBER INTERFEROMETER 审中-公开
    高分辨率表面等离子体显微镜,包括异步光纤干涉仪

    公开(公告)号:WO2010092302A3

    公开(公告)日:2010-10-21

    申请号:PCT/FR2010050227

    申请日:2010-02-11

    Abstract: The present invention relates to a high-resolution surface plasmon microscope that includes a heterodyne interferometer (6) splitting an excitation light beam into at least one reference beam and at least one measurement beam directed into an optical coupling medium (7) for generating a surface plasmon, said heterodyne interferometer essentially being formed from optical guiding fibres (12, 13, 14, 15) optically connected at a first of their ends to an optical coupler (16) and also optically connected at their second end to a light source (1), to an optical coupling medium (7), a reference-beam reflecting element (17) and means (28) for detecting an interferometer beam respectively.

    Abstract translation: 本发明涉及高分辨率表面等离子体激元显微镜,其包括外差干涉仪(6),其将激发光束分成至少一个参考光束和至少一个被引导到光学耦合介质(7)中的测量光束,用于产生表面 等离子体激元,所述外差干涉仪基本上由光导纤维(12,13,14,15)在其第一端处光学连接到光耦合器(16)并且还在其第二端处光学连接到光源(1 )分别耦合到光耦合介质(7),参考光束反射元件(17)和用于检测干涉仪光束的装置(28)。

    APPARATUS FOR AND A METHOD OF DETERMINING SURFACE CHARACTERISTICS
    7.
    发明申请
    APPARATUS FOR AND A METHOD OF DETERMINING SURFACE CHARACTERISTICS 审中-公开
    装置和方法确定表面特性

    公开(公告)号:WO2007060441A1

    公开(公告)日:2007-05-31

    申请号:PCT/GB2006/004391

    申请日:2006-11-22

    Abstract: A coherence scanning interferometer (2) carries out: a coherence scanning measurement operation on a surface area (81 ) carrying a structure using a low numeric aperture objective so that the pitch of the surface structure elements (82) is much less that the spread of the point spread function at the surface (7) to obtain structure surface intensity data; and a coherence scanning measurement operation on a non-structure surface area (83), which may be part of the same sample or a different sample, to obtain non-structure surface intensity data. A frequency transform ratio determiner (105) determines a frequency transform ratio (the HCF function) related to the ratio between the structure surface intensity data and the non-structure surface intensity data. A structure provider (109) sets that frequency transform ratio equal to an expression which represents the electric field at the image plane of the coherence scanning interferometer in terms of surface structure element size (height or depth) and width-to-pitch ratio and derives the surface structure element size and width-to-pitch ratio using the frequency transform ratio. The structure provider (109) may also extract the surface structure element width, if the pitch is independently known.

    Abstract translation: 相干扫描干涉仪(2)执行:在表面区域(81)上进行相干扫描测量操作,所述表面区域(81)承载使用低数值孔径物镜的结构,使得表面结构元件(82)的间距远小于 表面上的点扩散函数(7)获得结构表面强度数据; 以及在可以是相同样品或不同样品的一部分的非结构表面积(83)上进行相干扫描测量操作,以获得非结构表面强度数据。 变频比确定器(105)确定与结构表面强度数据和非结构表面强度数据之间的比率相关的频率变换比(HCF功能)。 结构提供者(109)根据表面结构元素尺寸(高度或深度)和宽度与间距比将该变换率设置为等于相干扫描干涉仪的像面处的电场的表达式,并导出 使用频率变换比的表面结构元件尺寸和宽度与间距比。 如果音调是独立已知的,则结构提供者(109)还可以提取表面结构元素宽度。

    LEAKY GUIDED-WAVE MODES USED IN INTERFEROMETRIC CONFOCAL MICROSCOPY TO MEASURE PROPERTIES OF TRENCHES
    8.
    发明申请
    LEAKY GUIDED-WAVE MODES USED IN INTERFEROMETRIC CONFOCAL MICROSCOPY TO MEASURE PROPERTIES OF TRENCHES 审中-公开
    用于干涉滤波显微镜测量雷达特性的漏洞导波模式

    公开(公告)号:WO2004068065A3

    公开(公告)日:2005-11-10

    申请号:PCT/US2004002156

    申请日:2004-01-27

    Inventor: HILL HENRY ALLEN

    Abstract: A method of using an interferometric confocal microscope to measure features of a trench or via in a. substrate, wherein the interferometric confocal microscope produces a measurement beam (240), the method involving: focusing the measurement beam at a selected location (168) at or near the bottom of the trench or via (150) to excite one or more guided-wave modes within the trench or via; measuring properties of a return measurement beam (242) that is produced when the measurement beam is focused at the selected location, wherein the return measurement beam includes a component corresponding to a radiated field from the one or more guided-wave modes that are excited within the trench; and determining the features of the trench or via from the measured properties of the return measurement beam.

    Abstract translation: 一种使用干涉式共焦显微镜来测量沟槽或通孔中的特征的方法。 衬底,其中所述干涉式共聚焦显微镜产生测量光束(240),所述方法包括:将所述测量光束聚焦在所述沟槽的底部或通过(150)处或附近的选定位置(168)处以激发一个或多个导向 - 沟槽或通孔内的波浪模式; 当所述测量光束聚焦在所选择的位置时产生的返回测量光束(242)的测量属性,其中所述返回测量光束包括对应于来自所述一个或多个激励的一个或多个导波模式的辐射场的分量 沟槽 以及从测量的测量光束的测量特性确定沟槽或通孔的特征。

    APPARATUS AND METHOD FOR JOINT MEASUREMENTS OF CONJUGATED QUADRATURES OF FIELDS OF REFLECTED/SCATTERED AND TRANSMITTED BEAMS BY AN OBJECT IN INTERFEROMETRY
    9.
    发明申请
    APPARATUS AND METHOD FOR JOINT MEASUREMENTS OF CONJUGATED QUADRATURES OF FIELDS OF REFLECTED/SCATTERED AND TRANSMITTED BEAMS BY AN OBJECT IN INTERFEROMETRY 审中-公开
    用于干涉测量的对象的反射/散射和透射的区域的相关联的测量的测量装置和方法

    公开(公告)号:WO2004068187A3

    公开(公告)日:2005-03-24

    申请号:PCT/US2004002166

    申请日:2004-01-27

    Inventor: HILL HENRY ALLEN

    Abstract: An interferometery system (110) for making interferometric measurements of an object, the system including: a beam generation module (124) which during operation delivers an output beam that includes a first beam at a first frequency and a second beam at a second frequency that is different from the first frequency, the first and second beams within the output beam being coextensive, the beam generation module including a beam conditioner (122) which during operation introduces a sequence of different shifts in a selected parameter of each of the first and second beams, the selected parameter selected from a group consisting of phase and frequency; a detector assembly having a detector element (170); and an interferometer constructed to receive the output beam at least a part of which represents a first measurement beam at the first frequency and a second measurement beam at the second frequency, the interferometer further constructed to image both the first and second measurement beams onto a selected spot on the object (160) to produce therefrom corresponding first and second return measurement beams, and to then simultaneously image the first and second return measurement beams onto said detector element (170).

    Abstract translation: 一种用于对物体进行干涉测量的干涉仪系统(110),所述系统包括:光束产生模块(124),其在操作期间传送包括第一频率的第一光束和第二频率的第二光束的输出光束, 与第一频率不同的是,输出光束内的第一和第二光束是共同延伸的,光束产生模块包括光束调节器(122),其在操作期间引入第一和第二光束中每一个的选定参数中的不同偏移序列 所述参数选自由相位和频率组成的组; 具有检测器元件(170)的检测器组件; 以及干涉仪,其被构造为接收输出光束,所述输出光束的至少一部分表示第一频率处的第一测量光束和在第二频率处的第二测量光束,所述干涉仪还被构造成将所述第一和第二测量光束成像到所选择的 (160)上产生相应的第一和第二返回测量光束,然后将第一和第二返回测量光束同时成像到所述检测器元件(170)上。

    IMAGING SYSTEMS
    10.
    发明申请
    IMAGING SYSTEMS 审中-公开
    成像系统

    公开(公告)号:WO2004032722A3

    公开(公告)日:2005-03-24

    申请号:PCT/US0332259

    申请日:2003-10-08

    CPC classification number: G01H9/002 G01B9/04 G01H9/00 G01J2009/0265

    Abstract: An imaging system includes: an object wavefront source (12) and an optical microscope objective (4) all positioned to direct an object wavefront onto an area of a vibrating subject (6) surface encompassed by a field of view of the microscope objective (4), and to direct a modulated object wavefront reflected from the encompassed surface area through a photorefractive material (XTAL); and a reference wavefront source (12) and at least one phase modulator (MOD) all positioned to direct a reference wavefront through the phase modulator (MOD) and to direct a modulated reference wavefront from the phase modulator (MOD) through the photorefractive material (XTAL) to interfere with the modulated object wavefront. The photorefractive material (XTAL) has a composition and a position such that interference of the modulated object wavefront and modulated reference wavefront occurs within the photorefractive material, (XTAL) providing a full-field, real-time image signal of the encompassed surface area (6).

    Abstract translation: 一种成像系统包括:物体波前源(12)和光学显微镜物镜(4),其全部定位成将物体波前引导到由显微镜物镜(4)的视场所包围的振动对象(6)表面的区域 ),并且通过光折射材料(XTAL)引导从包围的表面区域反射的被调制物体波前; 以及参考波前源(12)和至少一个相位调制器(MOD),所述至少一个相位调制器(MOD)全部定位成将参考波前引导通过相位调制器(MOD)并且通过光折射材料(MOD)将调制的参考波阵面从相位调制器 XTAL)干扰调制对象波前。 光折射材料(XTAL)具有组成和位置,使得调制对象波前和调制参考波阵面的干涉发生在光折射材料内,(XTAL)提供包围表面积的全场实时图像信号 6)。

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