PROCESS FOR PURIFYING ORGANIC SOLVENTS
    1.
    发明申请

    公开(公告)号:WO2021000318A1

    公开(公告)日:2021-01-07

    申请号:PCT/CN2019/094706

    申请日:2019-07-04

    Abstract: A process for purifying (i) a hydrophilic organic solvent, (ii) a hydrolysable organic solvent, or (iii) a mixture of a hydrophilic organic solvent and a hydrolysable organic solvent by removing ionic contaminants from the hydrophilic organic solvent, from the hydrolysable organic solvent, or from the mixture of a hydrophilic and a hydrolysable organic solvent without generation of by-product impurities, the process including the steps of contacting the hydrophilic organic solvent, the hydrolysable organic solvent, or the mixture of hydrophilic and hydrolysable organic solvents with a mixed bed of ion exchange resin; wherein the mixed bed of ion exchange resin includes a mixture of: (a) a weak-acid cationic ion exchange resin and (b) a weak-base anionic ion exchange resin.

    SOLVENT SYSTEMS FOR SYNTHESIS OF POLY(AMIC ACID) AND POLYIMIDE POLYMERS
    3.
    发明申请
    SOLVENT SYSTEMS FOR SYNTHESIS OF POLY(AMIC ACID) AND POLYIMIDE POLYMERS 审中-公开
    用于合成聚(氨基酸)和聚酰亚胺聚合物的溶剂体系

    公开(公告)号:WO2018058342A1

    公开(公告)日:2018-04-05

    申请号:PCT/CN2016/100461

    申请日:2016-09-28

    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of at least one of a sulfoxide, e.g., DMSO, and an alkyl phosphate, e.g., triethyl phosphate, and (B) optionally, a second component consisting essentially of at least one aprotic glycol ether, e.g., dipropylene glycol dimethyl ether.

    Abstract translation: 合成聚(酰胺酸)聚合物或聚酰亚胺聚合物的方法通过使用基本上由以下组分组成的溶剂体系而得到改进:(A)基本上由亚砜, 例如DMSO和磷酸烷基酯,例如磷酸三乙酯,和(B)任选地,第二组分基本上由至少一种非质子二醇醚例如二丙二醇二甲基醚组成。

    PROCESSES FOR PURIFYING GLYCOL ETHERS
    6.
    发明申请

    公开(公告)号:WO2022241689A1

    公开(公告)日:2022-11-24

    申请号:PCT/CN2021/094703

    申请日:2021-05-19

    Abstract: A processes for purifying glycol ethers, comprises (a) providing a glycol ether to a first vessel, the glycol ether, the glycol ether having the following formula: R 1-O- (CHR 2CHR 3) O) nR 4; wherein R 1 is an alkyl group having 1 to 9 carbon atoms or a phenyl group; wherein R 2 and R 3 each individually is hydrogen, a methyl group or an ethyl group, provided that when R 3 is a methyl group or an ethyl group, R 2 is hydrogen and provided that when R 2 is a methyl group or an ethyl group, R 3 is hydrogen; wherein R 4 is hydrogen, an alkyl group having 1 to 4 carbon atoms, an acetyl group, or a propionyl group; and wherein n is an integer of 1 to 3; (b) filling the first vessel with inert gas; (c) heating the glycol ether in the first vessel to a sub-boiling temperature, wherein the sub-boiling temperature is at least 15℃ less than the normal boiling point of the glycol ether; (d) cooling the vapor from the first vessel in a second vessel to provide a liquid; and (e) contacting the glycol ether with a mixed bed of ion exchange resins comprising cationic exchange resins and anionic ion exchange resins.

    SULFOXIDE/GLYCOL ETHER BASED SOLVENTS FOR USE IN THE ELECTRONICS INDUSTRY
    9.
    发明申请
    SULFOXIDE/GLYCOL ETHER BASED SOLVENTS FOR USE IN THE ELECTRONICS INDUSTRY 审中-公开
    基于硫醇/甘油醚的溶剂,用于电子行业

    公开(公告)号:WO2018058866A1

    公开(公告)日:2018-04-05

    申请号:PCT/CN2017/071798

    申请日:2017-01-20

    Abstract: Solvents useful for removing, among other things, photoresists and poly (amic acid) /polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N, N-dimethyl propionamide, 3-methoxy-N, N-dimethyl propanamide, triethyl phosphate, N, N-dimethyl acetamide; N, N-diethyl acetamide, N, N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.

    Abstract translation: 可用于从显示器/半导体基板或电子处理设备除去光致抗蚀剂和聚(酰胺酸)/聚酰亚胺等的溶剂基本上由以下组成:(A)第一组分,其由亚砜 ,例如DMSO; (B)由乙二醇醚如乙二醇单丁醚组成的第二组分; (C)由N-甲酰吗啉,N,N-二甲基丙酰胺,3-甲氧基-N,N-二甲基丙酰胺,磷酸三乙酯,N,N-二甲基乙酰胺中的至少一种组成的第三组分; N,N-二乙基乙酰胺,N,N-二乙基丙酰胺,N-甲基乙酰胺,N-甲基丙酰胺,N-乙基乙酰胺和N-乙基丙酰胺。

    DMPA-BASED SOLVENT SYSTEMS FOR THE SYNTHESIS OF POLY(AMIC ACID) AND POLYIMIDE POLYMERS
    10.
    发明申请
    DMPA-BASED SOLVENT SYSTEMS FOR THE SYNTHESIS OF POLY(AMIC ACID) AND POLYIMIDE POLYMERS 审中-公开
    用于合成聚氨酯酸和聚酰亚胺聚合物的DMPA基溶剂体系

    公开(公告)号:WO2018058343A1

    公开(公告)日:2018-04-05

    申请号:PCT/CN2016/100465

    申请日:2016-09-28

    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of N, N-dimethyl propionamide (DMPA), and (B) optionally, a second component consisting essentially of at least one of a sulfoxide, e.g., DMSO, an alkyl phosphate, e.g., triethyl phosphate, and an aprotic glycol ether, e.g., propylene glycol methyl ether acetate.

    Abstract translation: 合成聚(酰胺酸)聚合物或聚酰亚胺聚合物的方法通过使用基本上由以下组分组成的溶剂体系来改进:(A)基本上由N,N-二甲基丙酰胺( (B)任选地,第二组分基本上由亚砜如DMSO,磷酸烷基酯如磷酸三乙酯和非质子二醇醚如丙二醇甲醚乙酸酯中的至少一种组成。 / p>

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