公开(公告)号：WO2003095505A1

公开(公告)日：2003-11-20

申请号：PCT/US2003/014298

申请日：2003-05-07

Applicant: HONEYWELL INTERNATIONAL INC.

Inventor： NAIR, Haridasan, K. ,  VAN DER PUY, Michael ,  POSS, Andrew, J. ,  NALENWAJEK, David

IPC: C08F8/18

CPC classification number: C07D487/08 ,  C07C17/16 ,  C07C17/30 ,  C07C22/02 ,  C07C33/44 ,  C07C67/343 ,  C07C67/347 ,  C07C2602/42 ,  C07D493/08 ,  C08F8/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  C07C21/18 ,  C07C23/14 ,  C07C69/65

Abstract: Provided are polymers derived from bridged heterocyclic compounds, fluorinated norbornene compounds, fluorinated alkenes, heterocyclic compounds, and combinations of two or more thereof for use in a wide variety of applications, including photoresist compositions. Also provided are methods for producing the monomer compounds for use in the present polymers.

Abstract translation: 提供衍生自桥联杂环化合物，氟化降冰片烯化合物，氟化烯烃，杂环化合物以及其两种或多种的组合的聚合物，用于各种应用中，包括光致抗蚀剂组合物。 还提供了用于生产用于本发明聚合物的单体化合物的方法。