公开(公告)号：WO2018191704A1

公开(公告)日：2018-10-18

申请号：PCT/US2018/027636

申请日：2018-04-13

Applicant: IONEER, LLC

Inventor： CHEN, Anthony

IPC: H01J37/244 ,  B23K26/02 ,  G01N23/22 ,  H01J37/02 ,  H05H1/00 ,  H05H1/24

Abstract: A method of characterizing a Plasma Processing Reactor (PPR) by measuring the electromagnetic (EM) emissions of a plasma inside the PPR using an Optical Plasma Monitoring Apparatus (OPMA) is described. The OPMA contains a plurality of photo-sensors that can measure EM emissions of narrow and/or broad spectral regions at various selected positions on the OPMA, and record them as a function of time. The OPMA can have substantially similar dimensions of a workpiece to facilitate loading and unloading into the PPR.

公开(公告)号：WO2017100132A1

公开(公告)日：2017-06-15

申请号：PCT/US2016/064987

申请日：2016-12-05

Applicant: IONEER, LLC

Inventor： CHEN, Anthony

IPC: H01L21/00 ,  G06F19/00 ,  H01L21/02 ,  H01L21/302 ,  H01L21/66

CPC classification number: B24B37/005 ,  G05B19/41875 ,  G05B2219/45031 ,  Y02P90/04 ,  Y02P90/22

Abstract: Various examples of the present technology disclose a self-contained and programmable Processing Probe Apparatus (PPA) that can measure processing properties of a processing tool. The PPA comprises one or more sensors, an analog-to-digital converter and information (ADCI) processor, an electrical power source (EPS), and a digital signal communication device, all of which are attached to a flexible film. The flexible film can be mounted on a substrate that mimics a semiconductor workpiece.

Abstract translation: 本技术的各种示例公开了可以测量处理工具的处理特性的独立且可编程的处理探测装置（PPA）。 PPA包括一个或多个传感器，模数转换器和信息（ADCI）处理器，电源（EPS）以及数字信号通信设备，所有这些都连接到柔性膜上。 柔性薄膜可以安装在模拟半导体工件的基板上。