AMBIPOLAR OXIDE-SEMICONDUCTOR BASED TRANSISTOR AND METHOD OF MANUFACTURING

    公开(公告)号:WO2023042091A1

    公开(公告)日:2023-03-23

    申请号:PCT/IB2022/058660

    申请日:2022-09-14

    Abstract: An ambipolar, gate all around, semiconductor-based transistor (600) includes a substrate (602), a first-type channel structure (106) of a first-type material located on the substrate (602), the first-type channel structure (106) having a gate region, a source region, and a drain region, a second-type channel structure (310) of a second- type material completely surrounding the gate region of the first-type channel structure (106), but not present on the source region and the drain region. Furthermore, a dielectric material (108) fully surrounds the second-type material (310), a gate electrode (110) completely surrounds the dielectric material (108)., a source electrode is located on the source region and a drain electrode is located on the drain region. The first and second materials are semiconductor oxides, preferably Ga2O3 and NiO, the first-type material is one of p-or n-type and the second-type material is the other of the p- or n-type.

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