公开(公告)号：WO2020159805A1

公开(公告)日：2020-08-06

申请号：PCT/US2020/014868

申请日：2020-01-24

Applicant: KLA CORPORATION

Inventor： PATWARY, Nurmohammed ,  WALLINGFORD, Richard ,  SMITH, James A. ,  LI, Xiaochun ,  TUMAKOV, Vladimir ,  BRAUER, Bjorn

IPC: G06T7/00 ,  G06T5/00

Abstract: A sample characterization system is disclosed. In embodiments, the sample characterization system includes a controller communicatively coupled to an inspection sub-system, the controller including one or more processors configured to execute a set of program instructions stored in memory, the set of program instructions configured to cause the one or more processors to: acquire one or more target image frames of a sample; generate a target tensor with the one or more acquired target image frames; perform a first set of one or more decomposition processes on the target tensor to form generate one or more reference tensors including one or more reference image frames; identify one or more differences between the one or more target image frames and the one or more reference image frames; and determine one or more characteristics of the sample based on the one or more identified differences.

公开(公告)号：WO2021225999A1

公开(公告)日：2021-11-11

申请号：PCT/US2021/030535

申请日：2021-05-04

Applicant: KLA CORPORATION

Inventor： CHEN, Hong ,  WU, Kenong ,  LI, Xiaochun ,  SMITH, James A. ,  SHIFRIN, Eugene ,  LUO, Qing ,  COOK, Michael ,  SI, Wilson Wei ,  YU, Leon ,  BRAUER, Bjorn ,  PATWARY, Nurmohammed ,  TROY, Neil ,  YNZUNZA, Ramon

IPC: G03F7/20 ,  G03F1/84 ,  G01N21/956 ,  G01N21/95 ,  G01N21/88 ,  G06K9/62 ,  G06T5/00

Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process performed on a wafer having features printed in a lithography process using a reticle. The at least one repeater defect detection step performed in the front-end processing includes identifying any defects detected at corresponding locations in two or more test images by double detection and any defects detected by stacked defect detection as first repeater defect candidates. One or more additional repeater defect detections may be performed on the first repeater defect candidates to generate final repeater defect candidates and identify defects on the reticle from the final repeater defect candidates.