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1.
公开(公告)号:WO2023069463A1
公开(公告)日:2023-04-27
申请号:PCT/US2022/047055
申请日:2022-10-18
Applicant: LAM RESEARCH CORPORATION
Inventor: THAULAD, Peter S. , HERZIG, Brett M. , GENETTI, Damon Tyrone , REINS, Charles Byron
Abstract: Apparatuses and methods for assisting in the calibration of a wafer-handling robot for a semiconductor processing tool are provided herein. Some embodiments include a calibration wafer having a nominally circular disk shape having an outer edge with a nominal diameter of 200mm ± 1mm, 300mm ± 1mm, or 450mm ± 1mm, two or more cutouts arranged along the outer edge, and a plurality of fiducial markers, in which each cutout is at least partially defined by one or more edges, each cutout extends radially inwards at least 2mm from a reference circle defined by the outer edge, and one or more fiducial markers are adjacent to each cutout.
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2.
公开(公告)号:WO2021022291A1
公开(公告)日:2021-02-04
申请号:PCT/US2020/070300
申请日:2020-07-21
Applicant: LAM RESEARCH CORPORATION
Inventor: SADEGHI, Hossein , BLANK, Richard M. , THAULAD, Peter S. , EMERSON, Mark E. , JEYAPALAN, Arulselvam Simon
IPC: H01L21/68 , B25J9/16 , H01L21/677 , H01L21/67
Abstract: Systems and techniques for determining and using multiple types of offsets for providing wafers to a wafer support of a wafer station of a semiconductor processing tool are disclosed; such techniques and systems may use an autocalibration wafer that may include a plurality of sensors, including a plurality of edge-located imaging sensors that may be used to image fiducials associated with two different structures located in a selected wafer station.
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公开(公告)号:WO2020096864A1
公开(公告)日:2020-05-14
申请号:PCT/US2019/059261
申请日:2019-10-31
Applicant: LAM RESEARCH CORPORATION
Inventor: THAULAD, Peter S. , HERZIG, Brett M. , BLANK, Richard M. , MOORING, Benjamin W.
IPC: H01L21/68 , H01L21/67 , H01L21/677 , H01L21/687 , H01L21/673
Abstract: Systems and techniques for determining and correcting inter-wafer misalignments in a stack of wafers transported by a wafer handling robot are discussed. An enhanced automatic wafer centering system is provided that may be used to determine a smallest circle associated with the stack of wafers, which may then be used to determine whether or not the stack of wafer meets various process requirements and/or if a centering correction can be made to better align the wafers with a receiving station coordinate frame.
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