公开(公告)号：WO2016171754A1

公开(公告)日：2016-10-27

申请号：PCT/US2015/051031

申请日：2015-09-18

申请人： INTEL CORPORATION

发明人： BORODOVSKY, Yan A.

IPC分类号： H01L21/027

CPC分类号： H01J37/3045 ,  H01J37/045 ,  H01J37/09 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/24475 ,  H01J2237/24578 ,  H01J2237/2817 ,  H01L21/0277 ,  H01L21/0337 ,  H01L21/31144 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/54473

摘要： Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a method of fine alignment of an e-beam tool includes projecting an electron image of a plurality of apertures of an e-beam column over an X-direction alignment feature of a wafer while moving the wafer along the Y-direction. The method also includes detecting a time-resolved back-scattered electron (BSE) detection response waveform during the projecting. The method also includes determining an X-position of every edge of every feature of the X-direction alignment feature by calculating a derivative of the BSE detection response waveform. The method also includes, subsequent to determining an X-position of every edge of every feature of the X-direction alignment feature, adjusting an alignment of the e-beam column to the wafer.

摘要翻译： 描述适用于涉及补充电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，电子束工具的精细对准的方法包括在晶片的X方向对准特征上投射电子束列的多个孔的电子图像，同时沿着Y方向移动晶片 。 该方法还包括在投影期间检测时间分辨的反向散射电子（BSE）检测响应波形。 该方法还包括通过计算BSE检测响应波形的导数来确定X方向对准特征的每个特征的每个边缘的X位置。 该方法还包括在确定X方向对准特征的每个特征的每个边缘的X位置之后，调整电子束列与晶片的对准。

公开(公告)号：WO2015191103A1

公开(公告)日：2015-12-17

申请号：PCT/US2014/071650

申请日：2014-12-19

申请人： INTEL CORPORATION

发明人： NELSON, Donald, W. ,  BORODOVSKY, Yan, A. ,  PHILLIPS, Mark, C. ,  BIGWOOD, Robert, M.

IPC分类号： H01L21/027

CPC分类号： H01L21/31144 ,  G03F7/2059 ,  G03F7/7045 ,  H01J37/045 ,  H01J37/3026 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/303 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01L21/0277

摘要： Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a method of data compression or data reduction for e-beam tool simplification involves providing an amount of data to write a column field and to adjust the column field for field edge placement error on a wafer, wherein the amount of data is limited to data for patterning approximately 10% or less of the column field. The method also involves performing e-beam writing on the wafer using the amount of data.

摘要翻译： 描述适用于涉及补充电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，用于电子束工具简化的数据压缩或数据简化的方法包括提供一定量的数据来写入列字段并且调整用于晶片上的场边缘放置误差的列字段，其中数据量是 限于用于图案化的大约10％或更少的列场的数据。 该方法还涉及使用数据量在晶片上执行电子束写入。

公开(公告)号：WO2015191102A1

公开(公告)日：2015-12-17

申请号：PCT/US2014/071645

申请日：2014-12-19

申请人： INTEL CORPORATION

发明人： NELSON, Donald W. ,  BORODOVSKY, Yan A. ,  PHILLIPS, Mark C.

IPC分类号： H01L21/027

CPC分类号： H01L23/5283 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/303 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01L21/0277 ,  H01L21/31144 ,  H01L21/76816 ,  H01L21/76886 ,  H01L27/0207 ,  H01L27/11

摘要： Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a layout for a metallization layer of an integrated circuit includes a first region having a plurality of unidirectional lines of a first width and a first pitch and parallel with a first direction. The layout also includes a second region having a plurality of unidirectional lines of a second width and a second pitch and parallel with the first direction, the second width and the second pitch different than the first width and the first pitch, respectively. The layout also includes a third region having a plurality of unidirectional lines of a third width and a third pitch and parallel with the first direction, the third width and the third pitch different than the first and second widths and different than the first and second pitches.

摘要翻译： 描述适用于涉及互补电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，集成电路的金属化层的布局包括具有第一宽度和第一间距并与第一方向平行的多个单向线的第一区域。 布局还包括具有第二宽度和第二间距的多个单向线并且与第一方向平行的第二区域，第二宽度和第二间距分别与第一宽度和第一间距不同的第二区域。 布局还包括具有第三宽度和第三间距的多个单向线并且与第一方向平行的第三区域，第三宽度和第三间距不同于第一和第二宽度并且不同于第一和第二间距 。

公开(公告)号：WO2015170972A1

公开(公告)日：2015-11-12

申请号：PCT/NL2015/050303

申请日：2015-05-01

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： VIJVERBERG, Joep Gerard ,  PLANDSOEN, Laurens Vincent ,  VAN GELDER, Bas ,  DE BOER, Guido ,  DANSBERG, Michel Pieter

IPC分类号： G03F7/20

CPC分类号： B25J11/00 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F9/7096 ,  H01J37/16 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/166 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67775

摘要： The invention relates to an assembly (1) for enclosing a target processing machine. The assembly comprises an enclosure (2) and a transfer unit (3). The enclosure comprises a base plate (21) for arranging said target processing machine thereon, side wall panels (22), which are fixed to said base plate, and a top wall panel (23) which is fixed to said side wall panels. In addition, the enclosure comprises an access opening (24) in a side wall of the enclosure. The transfer unit comprising one or more transfer elements (31) for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel (32) which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling (33) which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

摘要翻译： 本发明涉及一种用于封闭目标加工机器的组件（1）。 组件包括外壳（2）和传送单元（3）。 所述外壳包括用于在其上布置所述目标加工机的基板（21），固定到所述基板的侧壁板（22）和固定到所述侧壁板上的顶壁板（23）。 此外，外壳包括在外壳的侧壁中的进入开口（24）。 传送单元包括用于相对于基板移动传送单元的一个或多个传送元件（31）。 传送单元还包括门板（32），其被设置成关闭进入开口，其中门板通过柔性联接件（33）可移动地安装到传送单元上，该柔性联接器允许门板相对于 至少在朝向和/或远离外壳的方向上传送到传送单元。

公开(公告)号：WO2015024956A1

公开(公告)日：2015-02-26

申请号：PCT/EP2014/067714

申请日：2014-08-20

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： DE JONG, Hendrik Jan

IPC分类号： H01L21/67

CPC分类号： H01J37/3177 ,  F26B21/004 ,  H01J37/20 ,  H01J2237/0437 ,  H01L21/67034

摘要： The invention relates to a drying apparatus for use in a lithography system for drying a planar object such as a wafer, the apparatus comprising a drying device for eliminating liquid or droplets thereof from a planar target such as a wafer, wherein said device comprises a first slit and a second slit arranged in close proximity of the target, a gap being present between the target and the dryer, the first slit included for supplying pressurised gas into said gap directed to the target, the second slit included for discharging said liquid by means of said gas away from the target.

摘要翻译： 本发明涉及一种用于干燥平面物体（如晶片）的光刻系统的干燥设备，该干燥设备包括用于从诸如晶片的平面靶去除液体或液滴的干燥设备，其中所述设备包括第一 狭缝和设置在所述目标附近的第二狭缝，在所述目标和所述干燥器之间存在间隙，所述第一狭缝包括用于将压缩气体供给到所述目标物的所述间隙中，所述第二狭缝包括用于通过装置排出所述液体 的气体远离目标。

公开(公告)号：WO2014065663A1

公开(公告)日：2014-05-01

申请号：PCT/NL2013/050746

申请日：2013-10-24

申请人： TECHNISCHE UNIVERSITEIT DELFT

发明人： KRUIT, Pieter

IPC分类号： G01N23/203 ,  G01N23/225 ,  H01J37/28

CPC分类号： H01J37/28 ,  G01N23/2251 ,  G01N2223/33 ,  G01N2223/3307 ,  G01N2223/413 ,  G01N2223/418 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/2446

摘要： The invention relates to an apparatus and method for inspecting a sample. The apparatus comprises a generator for generating an array of primary charged particle beams (33), and a charged particle optical system with an optical axis (38). The optical system comprises a first lens system (37, 310) for focusing all primary beams (33) into a first array of spots in an intermediate plane, and a second lens system (313, 314) for focusing all primary beams (33) into a second array of spots on the sample surface (315). The apparatus comprises a position sensitive backscattered charged particle detector (311) positioned at or near the intermediate plane. The second lens system comprises an electromagnetic or electrostatic lens which is common for all charged particle beams. Preferably the second lens system comprises a magnetic lens for rotating the array of primary beams (33) around the optical axis (38) to position the second array of charged particle spots with respect to the first array at an angle.

摘要翻译： 本发明涉及一种用于检查样品的装置和方法。 该装置包括用于产生初级带电粒子束（33）的阵列的发生器和具有光轴（38）的带电粒子光学系统。 光学系统包括用于将所有主光束（33）聚焦成中间平面中的第一阵列的第一透镜系统（37,310）和用于聚焦所有主光束（33）的第二透镜系统（313,314） 成为样品表面上的第二阵列的斑点（315）。 该装置包括位于中间平面处或附近的位置敏感反向散射带电粒子检测器（311）。 第二透镜系统包括对于所有带电粒子束是共同的电磁或静电透镜。 优选地，第二透镜系统包括用于围绕光轴（38）旋转主光束阵列（33）的磁透镜，以相对于第一阵列以一定角度定位带电粒子斑点的第二阵列。

公开(公告)号：WO2013171216A4

公开(公告)日：2014-04-10

申请号：PCT/EP2013059948

申请日：2013-05-14

申请人： MAPPER LITHOGRAPHY IP BV

发明人： SPRENGERS JOHANNES PETRUS ,  OTTEN CHRISTIAAN ,  JAGER REMCO ,  STEENBRINK STIJN WILLEM HERMAN KAREL ,  KONING JOHAN JOOST ,  URBANUS WILLEM HENK ,  VAN VEEN ALEXANDER HENDRIK VINCENT

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/31774 ,  H01J2237/31794

摘要： A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

摘要翻译： 一种带电粒子多子束光刻系统，包括用于产生子束的子束发生器，用于形成调制子束的子束调制器以及用于将调制子束投影到目标表面上的子束投影器。 发生器，调制器和/或投影仪包括一个或多个提供有小孔的板，以使子束穿过板。 孔被分组以形成不同于不具有小射束孔径的非射束区域的射束区域。 至少一个带有孔的板设置有冷却装置（93），冷却装置（93）在其表面上布置在非束区域中。 该冷却装置包括具有用于接收冷却液体的入口（31）的板状主体，​​用于在其中输送冷却液体的多个冷却通道（94）以及用于移除冷却液体的出口（35）。 在冷却通道之间，板状体具有与梁区域对齐的槽（34）。

公开(公告)号：WO2013171216A9

公开(公告)日：2014-02-20

申请号：PCT/EP2013059948

申请日：2013-05-14

申请人： MAPPER LITHOGRAPHY IP BV

发明人： SPRENGERS JOHANNES PETRUS ,  OTTEN CHRISTIAAN ,  JAGER REMCO ,  STEENBRINK STIJN WILLEM HERMAN KAREL ,  KONING JOHAN JOOST ,  URBANUS WILLEM HENK ,  VAN VEEN ALEXANDER HENDRIK VINCENT

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/31774 ,  H01J2237/31794

摘要： A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

摘要翻译： 一种带电粒子多子束光刻系统，包括用于产生子束的子束发生器，用于形成调制子束的子束调制器和用于将调制的子束投影到目标表面上的子束投影仪。 发生器，调制器和/或投影仪包括设置有用于使子束通过板的孔的一个或多个板。 孔被分组以形成与不具有子束孔的非光束区域不同的光束区域。 具有孔的至少一个板设置有在非横梁区域中设置在其表面上的冷却装置（93）。 冷却装置包括具有用于接收冷却液的入口（31）的板状体，用于将冷却液输送到其中的多个冷却通道（94）和用于除去冷却液的出口（35）。 在冷却通道之间，板状体具有与梁区对准的槽（34）。

公开(公告)号：WO2013139878A2

公开(公告)日：2013-09-26

申请号：PCT/EP2013/055865

申请日：2013-03-20

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： KRUIT, Pieter ,  SMITS, Marc

IPC分类号： G03F7/20

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F15D1/025 ,  G03F7/70925 ,  G21K2201/06 ,  H01J9/38 ,  H01J37/3007 ,  H01J37/3177 ,  H01J37/32862 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/327 ,  Y10T137/2082 ,  Y10T137/87571

摘要： The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber (2) in which a plasma may be formed. The chamber has an inlet (5) for receiving an input gas, and one or more outlets (6) for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device (40) for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.

摘要翻译： 本发明涉及一种输送自由基的装置。 该装置包括等离子体发生器和引导体。 等离子体发生器包括可以形成等离子体的腔室（2）。 腔室具有用于接收输入气体的入口（5）和用于去除其中产生的至少一种等离子体和自由基的一个或多个出口（6）。 引导体是中空的，并且被布置成用于将形成在等离子体中的自由基引导到要去除污染物沉积的区域或体积。 腔室入口联接到压力装置（40），用于向腔室提供脉冲压力，以便在引导体中产生流动。

公开(公告)号：WO2013132081A2

公开(公告)日：2013-09-12

申请号：PCT/EP2013/054782

申请日：2013-03-08

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： VERGEER, Niels

CPC分类号： G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7088 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30438

摘要： A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.

摘要翻译： 一种用于操作用于处理卡盘（13）上的目标（23）的目标处理系统的方法，所述方法包括提供至少第一卡盘位置标记（27）和第二卡盘位置标记 （28）在卡盘（13）上; 提供被布置用于检测所述第一和第二卡盘位置标记（27,28）的对准感测系统（17），所述对准感测系统（17）包括至少第一对准传感器（61）和第二对准传感器（62）; 基于所述对准感测系统（17）的至少一个测量结果将所述卡盘（13）移动到第一位置; 并测量至少一个与卡盘第一位置有关的值。