Abstract:
A metal dichalcogenide layer is produced on a transfer substrate by seeding F 16 CuPc molecules on a surface of a growth substrate, growing a layer {e.g., a monolayer) of a metal dichalcogenide via chemical vapor deposition on the growth substrate surface seeded with F 16 CuPc molecules, and contacting the F 16 CuPc- molecule and metal-dichalcogenide coated growth substrate with a composition that releases the metal dichalcogenide from the growth substrate.
Abstract:
Aromatic molecules are seeded on a surface of a growth substrate; and a layer {e.g., a monolayer) of a metal dichalcogenide is grown via chemical vapor deposition on the growth substrate surface seeded with aromatic molecules. The seeded aromatic molecules are contacted with a solvent that releases the metal dichalcogenide layer from the growth substrate. The metal dichalcogenide layer can be released with an adhered transfer medium and can be deposited on a target substrate.