HYBRID HIGH-VOLTAGE LOW-VOLTAGE FINFET DEVICE

    公开(公告)号:WO2019112906A1

    公开(公告)日:2019-06-13

    申请号:PCT/US2018/063428

    申请日:2018-11-30

    Abstract: An integrated circuit includes a plurality of low-voltage FinFET transistors each having a channel length l and a channel width w, the low-voltage FinFET transistors having a first threshold voltage channel implant and a first gate dielectric thickness. The integrated circuit also includes a plurality of high-voltage FinFET transistors each having the channel length / and the channel width w , the high-voltage FinFET transistors having a second threshold voltage channel implant greater than the first threshold voltage channel implant and second gate dielectric thickness greater than the first gate dielectric thickness.

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