公开(公告)号：WO2022015410A1

公开(公告)日：2022-01-20

申请号：PCT/US2021/032847

申请日：2021-05-18

Applicant: MIRACLON CORPORATION

Inventor： KARIM, Alavi ,  STEPANOV, Arsen ,  ALI, M., Zaki

IPC: B41C1/10 ,  B41C3/00 ,  B41M5/392 ,  B41M5/395 ,  B41M5/44 ,  G03F7/075 ,  C09D133/10 ,  G03F7/033 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/30

Abstract: A relief-forming precursor includes a substrate and a relief-forming layer having: a polymer; at least one photopolymerizable monomer; a photopolymerization initiator; and a low surface energy monomer. A relief-forming assembly includes a relief-forming precursor having a low surface energy monomer and a mask element that is in complete optical contact with the relief-forming surface. A method of making a relief image includes: exposing the relief-forming layer to curing UV radiation through the mask element to form an imaged relief-forming layer with polymerized regions and non-polymerized regions; removing the mask element from the imaged relief-forming layer; and developing the imaged relief-forming layer by removing the non-polymerized regions, thereby forming a relief image. A relief image layer has an elastomer and copolymer that includes at least one photopolymerized monomer and a low surface energy monomer that has a silicone moiety with a relief surface having the silicone moiety.