PROTECTIVE STRUCTURES FOR MANUFACTURE OF METASURFACES

    公开(公告)号:WO2022063705A1

    公开(公告)日:2022-03-31

    申请号:PCT/EP2021/075690

    申请日:2021-09-17

    摘要: The present disclosure describes techniques that, in some instances, can help reduce stress and potential damage during the manufacture of optical elements such as those that include a metastructure formed by imprinting. In one aspect, a method of manufacturing an optical element includes imprinting a stamp into a polymeric material on a substrate, wherein the stamp includes first projections corresponding to an active area of the stamp for formation of meta-atoms in the polymeric material. The stamp further includes a protective structure laterally surrounding the first projections. The protective structure includes at least one additional projection extending in parallel to the first projections. The method includes removing the stamp from the polymeric material, thereby forming openings in the polymeric material in positions corresponding to the first projections and in one or more positions corresponding to the at least one additional projection.

    REPLICATION MATERIAL REMOVAL
    3.
    发明申请

    公开(公告)号:WO2021260098A1

    公开(公告)日:2021-12-30

    申请号:PCT/EP2021/067324

    申请日:2021-06-24

    摘要: A method includes pressing a face of a stamp into a first portion of a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, exposing the first portion of the replication material to illumination, to modify the first portion of the replication material, and subsequently removing a second portion of the replication material that was not exposed to the illumination. An optical device includes a substrate, a portion of replication material disposed on a first surface of the substrate, the portion of replication material forming one or more diffractive optical elements, and a masking layer disposed on a second surface of the substrate, the second surface being opposite the first surface, in which a sidewall of the replication material has a straight profile, and in which the masking layer defines an aperture aligned with the portion of the replication material.