公开(公告)号：WO2014172102A1

公开(公告)日：2014-10-23

申请号：PCT/US2014/032714

申请日：2014-04-02

Applicant: REC SILICON INC

Inventor： JULSRUD, Stein ,  SJASTAD, Anja, O.

IPC: C01B33/08 ,  C01B33/107

CPC classification number: C01B33/1071 ,  Y02E60/324

Abstract: Methods for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient hydrogen is added to a silicon tetrachloride process stream to inhibit iron (II) chloride formation and reduce iron silicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof. Trichlorosilane also may be added to the silicon tetrachloride process stream.

Abstract translation: 公开了在氢氯硅烷生产设备中还原铁硅化物和/或磷化铁结垢和/或腐蚀的方法。 向四氯化硅工艺流中加入足够的氢以抑制氯化铁（II）的形成并减少铁硅化物和/或磷化铁结垢，过热器腐蚀或其组合。 也可以在四氯化硅工艺流中加入三氯硅烷。