摘要:
A polymeric film includes a polymer matrix having at least one of a discrete RSNO adduct or a polymeric RSNO adduct associated therewith, by: covalent attachment to the polymer matrix; dispersion within the polymer matrix; or both, with the at least one of the discrete RSNO adduct or the polymeric RSNO adduct capable of releasing nitric oxide (NO). The polymer matrix is a polyurethane polymer matrix, a silicone rubber polymer matrix, or a copolymer matrix of polyurethane and silicone rubber. The polymeric film is to exhibit stability under dry conditions at 37°C and prolonged and controllable NO release rates, when exposed to moisture or light capable of photolyzing an RSNO bond, for a predetermined amount of time from the at least one of the discrete RSNO adduct or the polymeric RSNO adduct.