SEMICONDUCTOR STRUCTURES
    1.
    发明申请

    公开(公告)号:WO2021255426A1

    公开(公告)日:2021-12-23

    申请号:PCT/GB2021/051485

    申请日:2021-06-15

    Abstract: A semiconductor device comprises a substrate, one or more first III- semiconductor layers, and a plurality of superlattice structures between the substrate and the one or more first layers. The plurality of superlattice structures comprises an initial superlattice structure and one or more further superlattice structures between the initial superlattice structure and the one or more first layers. The plurality of superlattice structures is configured such that a strain-thickness product of semiconductor layer pairs in each superlattice structure of the one or more further superlattice structures is greater than or equal to a strain-thickness product of semiconductor layer pairs in superlattice structure(s) of the plurality of superlattice structures between that superlattice structure and the substrate. The plurality of superlattice structures is also configured such that a strain-thickness product of semiconductor layer pairs in at least one of the one or more further superlattice structures is greater than a strain-thickness product of semiconductor layer pairs in the initial superlattice structure.

Patent Agency Ranking