NON-VOLATILE RESISTIVE RANDOM ACCESS MEMORY AND A MANUFACTURING METHOD THEREFOR

    公开(公告)号:WO2020109991A1

    公开(公告)日:2020-06-04

    申请号:PCT/IB2019/060168

    申请日:2019-11-26

    Abstract: The invention relates to a non-volatile resistive random access memory (ReRAM), a non-volatile ReRAM composition and to a method for manufacturing a non-volatile non-volatile ReRAM. The ReRAM includes a first electrode, a second electrode and a resistive switching/active layer which is located between the first and second electrodes. The switching layer contains chitosan and aluminium doped/incorporated zinc oxide. The switching/active layer may be configured to perform a switching operation according to an applied voltage. The switching/active layer may be in the form of a film. The switching/active layer may be coated/applied onto the first electrode and the second electrode may be placed/applied/provided over the switching/active layer such that the switching/active layer is located/wedged in-between the two electrodes.

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