公开(公告)号：WO2021198012A1

公开(公告)日：2021-10-07

申请号：PCT/EP2021/057741

申请日：2021-03-25

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: B41C1/02 ,  B41N3/00 ,  B65G21/08 ,  G03F7/26 ,  B41C1/025 ,  B41N3/006 ,  B65G49/0413 ,  G03F7/3042

Abstract: An apparatus (1000) for treating a relief plate precursor (P), such as a printing plate precursor, with a liquid, comprising: a treatment compartment (400) configured for treating the relief plate precursor with a liquid; a transport system (210) for use with one or more transport bars (100), wherein a transport bar thereof is configured to be coupled to a relief plate precursor, said transport system being configured to move the transport bar with the coupled relief plate precursor through the treatment compartment (400); and said transport bar being provided with a coupling portion (121, 122) configured to couple the transport bar to the transport system; a protection system (900) configured to guide and evacuate liquid such that the transport system is protected against wetting with the liquid of the treatment compartment.

公开(公告)号：WO2022129531A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/086502

申请日：2021-12-17

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: B65H9/10 ,  B25J15/06 ,  B41C1/00 ,  B65G47/91 ,  B65G49/06 ,  B41N3/00 ,  B41C1/10 ,  B65H7/08 ,  B65H7/10 ,  B65H3/08 ,  G03F9/00 ,  B65G47/244 ,  G01B11/00 ,  B41F27/12

Abstract: An apparatus for aligning an edge, typically a leading edge of a plate, in particular a printing plate or a printing plate precursor, said apparatus comprising a support (100) configured for supporting the plate on a support surface, and intended to be located upstream of a treatment station; at least two movable elements (501, 502) arranged to be moved by an edge, typically a leading edge, of the plate, said at least two movable elements comprising a first and a second movable element; a detection means (601, 602) configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component (100, 250) configured to perform an action on the plate; and a control means (700) configured to control the at least one controllable component based on the first and second measure.

公开(公告)号：WO2021224342A1

公开(公告)日：2021-11-11

申请号：PCT/EP2021/061894

申请日：2021-05-05

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: G03F7/30

Abstract: An apparatus for treating a relief precursor (P), such as a printing plate precursor, with a liquid (L), comprising: a treatment compartment (400) with treatment means (450) configured to treat a relief plate precursor with a liquid and to remove pieces from the relief precursor; and a liquid collection system (900) configured to receive liquid and removed pieces from the treatment means (450); wherein the liquid collection system is configured to separate pieces having dimensions larger than predefined minimum dimensions from the liquid and to allow at least some of said pieces to be dissolved at least partially in the liquid at least when the liquid is in a static state after or before a treatment of the relief precursor with the treatment means.

公开(公告)号：WO2022129534A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/086506

申请日：2021-12-17

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: B41F27/12 ,  B41C1/02 ,  B41N3/00 ,  G03F7/30

Abstract: System for moving a flexible plate (P), in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station (S2), such as a washer station, said system comprising: a support (100) configured for supporting the plate on a support surface thereof, and intended to be located upstream of the treatment station; a movement means (200) comprising a plate engagement means (250) configured to contact the plate in such a way that the plate is engaged by adhesion or by friction or a combination thereof, in a movement mode, and that the plate can be slid over the support surface by controlling the movement means (200) in the movement mode; a control means configured to control the movement means such that the plate is slid over the support in the direction of the treatment station.

公开(公告)号：WO2022128114A1

公开(公告)日：2022-06-23

申请号：PCT/EP2020/086857

申请日：2020-12-17

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: B41F27/12 ,  B41C1/02 ,  B41N3/00 ,  G03F7/30

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, comprising a support for supporting the plate on a support surface thereof; an articulated operating arm extending substantially parallel to the support surface and comprising a first segment and a second segment; said first segment having a first end which is rotatably connected to said second segment around a first rotation axis substantially perpendicular to the support surface, and a second end provided with a plate engagement means to contact the plate; said second segment being rotatable around a second rotation axis substantially perpendicular to the support surface; a control means to control the rotation of the first and second segment, such that the plate is slid over the support in the direction of the treatment station.

公开(公告)号：WO2021255296A1

公开(公告)日：2021-12-23

申请号：PCT/EP2021/066855

申请日：2021-06-21

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: G03F7/20 ,  G03F7/2004 ,  G03F7/2012 ,  G03F7/2016 ,  G03F7/2022

Abstract: Apparatus for exposure of a relief precursor (P) having a first side (F) and an opposite second side (B), said apparatus comprising: a light source (1) configured to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means (2) configured to cause a first relative movement (M1) between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement (M2) between the light source and the relief precursor to expose the second side of the relief precursor, and to move (M3) the light source between a first position (Po1) and a second position (Po2), said first and second positions being on opposite sides of a plane of the relief precursor; wherein at least one of the first and the second relative movement (M1, M2) is a reciprocating movement.

公开(公告)号：WO2021069540A1

公开(公告)日：2021-04-15

申请号：PCT/EP2020/078203

申请日：2020-10-08

Applicant: XEIKON PREPRESS N.V.

Inventor： WATTYN, Bart Marc Luc

IPC: B26F1/00 ,  B41C1/10 ,  B41N3/00

Abstract: Punching station (300) for arranging one or more penetration elements in or through an edge portion of a relief plate precursor (P) or for arranging one or more perforations in the edge portion, comprising: a punching means (10) comprising one or more penetration elements (110) or perforating elements, said punching means being configured for arranging the one or more penetration elements or perforating elements through or in an edge portion of the relief plate precursor; an abutment means (20) aligned with the punching means and configured for forming an abutment for the edge of the relief plate precursor; a detection means (30) configured to detect at two or more locations along the abutment means whether the edge portion of the relief plate precursor is correctly positioned against the abutment means; a signalling means (40) configured to communicate a signal in function of the detection by the detection means.