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公开(公告)号：WO02052303A2
公开(公告)日：2002-07-04
申请号：PCT/EP0114846
申请日：2001-12-15
Applicant: ZEISS CARL SEMICONDUCTOR MFG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70241 , G02B13/143 , G02B13/22
Abstract: The invention relates to a projection illumination system and a projection lens comprising a lens arrangement consisting of at least one group of negative refractive lenses (LG2). Said lens group is comprised of at least 4 negative refractive lenses. A positive refractive lens (L9) is arranged in said lens group (LG2) after the third negative refractive lens (L8).
Abstract translation: 投影曝光装置中，用具有透镜组件的投影物镜的至少一个Linsegruupe负屈光力的（LG2），其中，这些透镜组包括至少4个透镜负Brechfraft我们和该透镜组的负的光焦度的第三透镜（LG2）（L8）中，透镜（L9）正 折射力被安排。
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公开(公告)号：WO2005059645A9
公开(公告)日：2006-06-08
申请号：PCT/EP2004014100
申请日：2004-12-10
Applicant: ZEISS CARL SMT AG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70341 , G02B1/02 , G02B13/143 , G03F7/70241 , G03F7/7035 , G03F7/70958
Abstract: A microlithography projection objective is proposed with optical elements, i.e. lenses or planar-parallel plates (used as end-closure plates) of crystalline magnesium fluoride, quartz, lanthanum fluoride, sapphire and Alpha-aluminium oxide. Suitable crystallographic orientations, crystal 10 combinations, and polarizations of the light are described. Suitable applications are for immersion lithography or near-field lithography in the DUV and VLN range, using the highest numerical aperture values.
Abstract translation: 提出了一种光刻元件，即晶体氟化镁，石英，氟化镧，蓝宝石和α-氧化铝的透镜或平面平行板（用作封端板）。 描述了合适的晶体取向，晶体10组合和光的偏振。 适用于DUV和VLN范围内的浸没式光刻法或近场光刻法，使用最高的数值孔径值。
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公开(公告)号：WO2007144125A3
公开(公告)日：2008-02-21
申请号：PCT/EP2007005127
申请日：2007-06-11
Applicant: ZEISS CARL SMT AG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G02B21/33 , G02B13/143 , G02B27/0006 , G03F7/70341 , G03F7/70808
Abstract: The invention relates to a lens system or a lens mirror system, in particular a projection objective, for imaging a pattern, in particular an object structure, that is arranged on an object plane of a lens system or the lens mirror system on an image plane of the projection objective with the aid of an immersion medium (2), that is arranged between an optical element (1) of the lens system or the lens mirror system and the image plane. A protective plate (13, 17) is arranged between the lens system and the immersion medium (2) and at least one means is arranged laterally on the element (1) and/or subsequently on the protective plate (3, 17) such that the sub pressure of the immersion medium (2) is much less on the external contour of the element (1), between the element (1) and the protective plate (3, 17) than on the immersion fluid itself. Suitable means are, for example, a seal, an intermediate immersion fluid, a surrounding lateral wall, supply and discharge lines for the exchange of the medium between the element (1) and the protective plate (3) or receiving means for adsorbing or absorbing an immersion agent (2).
Abstract translation: 透镜系统或透镜反射镜系统，以及在用于在透镜系统或透镜反射镜系统的物平面，与光学元件之间的液浸介质（2）的帮助下成像的，特别是投影透镜，布置图案，特别是对象结构的在投影透镜的像平面特定投射物镜（1 ）透镜系统或透镜镜系统和像面的配置，其中（在透镜系统和沉浸介质2）的保护板（3，17）设置，其中（与元件侧1）和/或随后向保护板（3之间， 17）的装置设置在至少使所述元件（1）的元件（1）和所述保护板（3之间的外轮廓的浸没介质（2）的分压，17）比所述浸没液体低得多 本身。合适的试剂是，例如，一个密封件，中间浸没液体 周边侧壁，入口和出口线，为介质的元件（1）和所述保护板之间的热交换（3）或接收用于吸附或吸收的浸渍装置的装置（2）。
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公开(公告)号：WO2006045748A2
公开(公告)日：2006-05-04
申请号：PCT/EP2005055422
申请日：2005-10-20
Applicant: ZEISS CARL SMT AG , WEIPPERT HANS-JOACHIM , SCHUSTER KARL-HEINZ
Inventor： WEIPPERT HANS-JOACHIM , SCHUSTER KARL-HEINZ
IPC: G03F7/20
CPC classification number: G03F7/70216 , G03F7/2041
Abstract: The invention relates to a projection exposure apparatus with a projection objective that serves to project a structure onto a substrate coated with a light-sensitive resist, wherein an immersion liquid is arranged between an optical element of the projection objective and the resist-coated substrate. As an immersion liquid saturated cyclic or polycyclic hydrocarbons can be used, such as for example cyclo-alkanes comprising up to 12 carbon atoms, saturated polycyclic hydrocarbons with 2 to 6 rings, bridged polycyclic hydrocarbons, cyclic ethers and derivatives of these substances.
Abstract translation: 本发明涉及一种具有投影物镜的投影曝光装置，该投影物体用于将结构投影到涂有光敏抗蚀剂的基板上，其中浸没液体布置在投影物镜的光学元件和抗蚀剂涂覆的基底之间。 作为浸渍液体，可以使用饱和的环状或多环烃，例如包含至多12个碳原子的环烷烃，具有2至6个环的饱和多环烃，桥连多环烃，环醚和这些物质的衍生物。
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公开(公告)号：WO03075097A2
公开(公告)日：2003-09-12
申请号：PCT/EP0301651
申请日：2003-02-19
Applicant: ZEISS CARL SMT AG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70975 , G02B13/143 , G03F7/70241 , G03F7/70958
Abstract: Disclosed is a refractive projection lens used in microlithography, which comprises a lens array in which all lenses are made of one material, and which has a numerical aperture (NA) of more than 0.7 on the image side. The light beam (23) transmitting through the lens array (21) is greater than 85 percent of the largest diameter (25) of the light beam or the maximum lens diameter in the area located upstream from a system diaphragm (19) which is disposed in the lens array (21) along a distance that is equal to the greatest diameter (25) of the light beam or the maximum lens diameter in the lens array (21).
Abstract translation: 对于具有其中所有的透镜的材料制成的透镜配置和图像侧数值孔径NA大于0.7包括微光刻，折射投影物镜，其中在所述透镜装置发送所述光束23在该区域中布置的前21系统孔径19的透镜装置21 的长度等于最大光束直径25或透镜阵列21中的最大Lindsendurmessers是最大光束直径为25或最大透镜直径的大于85％。
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Patent Agency Ranking
公开(公告)号：WO2007063136A3
公开(公告)日：2007-09-27
申请号：PCT/EP2006069233
申请日：2006-12-01
Applicant: ZEISS CARL SMT AG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70966 , G02B1/02 , G02B5/3091 , G02B27/0025
Abstract: The invention relates to the use of double-refractive partial layers (30, 32, 36, 38, 40, 42, 44 - 47) in coatings (5, 6, 10 - 21, 30, 32, 36, 38, 40, 42, 44 - 47) on optical elements, especially for microlithography objectives. Partial layers (30, 32, 36, 38, 40, 42, 44 - 47) with a modulated thickness are used.
Abstract translation: 本发明涉及在涂料（5，6，10使用双折射子层（30，32，36，38，40，42，44-47） - 21，30，32，36，38，40，42，44-47 ）上的光学元件，特别是用于微光刻的透镜。 在这种情况下，在它们的厚度找到调制子层（30，32，36，38，40，42，44-47）的应用程序。
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公开(公告)号：WO2005040890A3
公开(公告)日：2005-06-30
申请号：PCT/EP2004011587
申请日：2004-10-15
Applicant: ZEISS CARL SMT AG , SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
Inventor： SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
CPC classification number: G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
Abstract: A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
Abstract translation: 一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将位于物平面中的物场投影到第一实际中间图像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。
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8.发明申请ILLUMINATION SYSTEM FOR A WAVELENGTH = 193 NM, COMPRISING SENSORS FOR DETERMINING THE ILLUMINATION 审中-公开照明系统用于波长<= 193 nm的传感器，用于确定所述照明
公开(公告)号：WO2004031854A2
公开(公告)日：2004-04-15
申请号：PCT/EP0310605
申请日：2003-09-24
Applicant: ZEISS CARL SMT AG , ASML NETHERLANDS BV , SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
Inventor： SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
CPC classification number: G03F7/7085 , G03F7/70141 , G03F7/70558
Abstract: The invention relates to an illumination system for wavelengths
Abstract translation: 本发明涉及一种用于波长的照明系统<= 193纳米，其中所述照明系统包括一个光源，其提供可用的预定照明在一个平面和a）用第一光栅元件，其特征在于，所述第一光栅元件被布置在支撑元件上和第一光学部件 所述第一光学部件被布置在或在其上提供照明的平面附近。 本发明的特征在于：i）中设置在第一光学元件的至少一个传感器，用于在承载元件上的检测入射光的支撑元件上。 ⅱ）的照明系统的反射镜由传感器信号，使得Beleuctung的位置和强度被保持恒定的评价提供。
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公开(公告)号：WO2005059645A3
公开(公告)日：2005-10-20
申请号：PCT/EP2004014100
申请日：2004-12-10
Applicant: ZEISS CARL SMT AG , SCHUSTER KARL-HEINZ
Inventor： SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70341 , G02B1/02 , G02B13/143 , G03F7/70241 , G03F7/7035 , G03F7/70958
Abstract: A microlithography projection objective is proposed with optical elements, i.e. lenses or planar-parallel plates (used as end-closure plates) of crystalline magnesium fluoride, quartz, lanthanum fluoride, sapphire and Alpha-aluminium oxide. Suitable crystallographic orientations, crystal 10 combinations, and polarizations of the light are described. Suitable applications are for immersion lithography or near-field lithography in the DUV and VLN range, using the highest numerical aperture values.
Abstract translation: 微晶光刻投影物镜用光学元件，即结晶氟化镁，石英，氟化镧，蓝宝石和α-氧化铝的透镜或平面平行板（用作封闭板）提出。 描述了合适的晶体取向，晶体10组合和光的偏振。 使用最高的数值孔径值，适用于DUV和VLN范围内的浸入式光刻或近场光刻。
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10.发明申请
公开(公告)号：WO2005059653A2
公开(公告)日：2005-06-30
申请号：PCT/EP2004012707
申请日：2004-11-10
Applicant: ZEISS CARL SMT AG , TOTZECK MICHAEL , ENKISCH BIRGIT , SCHUSTER KARL-HEINZ
Inventor： TOTZECK MICHAEL , ENKISCH BIRGIT , SCHUSTER KARL-HEINZ
CPC classification number: G03F7/70566 , G02B5/1809 , G02B5/3083 , G02B27/286 , G03F7/70308
Abstract: The invention relates to a delay system for converting an input beam cluster incident from an input side of the delay system to an output beam cluster which has a spatial distribution of polarization states across its cross-section that can be influenced by the delay system, said distribution differing from the spatial distribution of polarization states of the input beam cluster. The inventive delay system is configured as a reflecting delay system. An effective cross-section of the delay system has a plurality of delay areas of different delay effect. A mirror system of this type having a delay effect that varies depending on the location can be used to compensate for undesired variations of the polarization state across the cross-section of an input beam cluster and/or for adjusting certain initial polarization states, e.g. for adjusting radial or tangential polarization.
Abstract translation: 用于从所述延迟电路输入辐射束的输入侧转换的入射光成具有偏振状态的延迟排列空间分布在其横截面，其从输入的辐射的偏振状态的空间分布不同的可影响辐射的输出束A延迟电路被形成为反射延迟装置。 延迟电路的一个有用的横截面具有不同的延迟效果的多个延迟区域。 这种具有依赖于位置的变化的延迟效果的反射镜组件可以被用来在偏振状态跨越辐射的输入光束的横截面补偿不需要的波动和/或用于某些EinstellugAusgansplarisationszustände，例如 用于调节径向或切向偏振。
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