Abstract:
Fluid fabric enhancer compositions comprising microcapsules having a cationic, nonionic and/or anionic coating, a formaldehyde source that can comprise components of said microcapsules and a formaldehyde scavenger, as well as processes for making and using such fluid fabric enhancer compositions. Such fluid fabric enhancer compositions contain a formaldehyde scavenging system that provides more consistent formaldehyde scavenging over time.
Abstract:
The present invention relates to a solid windshield washer composition comprising a first compound, wherein said solid windshield washer composion when dissolved in a liquid is freeze resistant at minus 10°C and below.
Abstract:
Hand sanitizers are provided with improved aesthetics and skin-conditioning effects, such that healthcare workers and others subject to high frequency hand hygiene requirements are encouraged to comply with said requirements. The hand sanitizers provide excellent antimicrobial efficacy and skin conditioning benefits that actually increase with increased frequency of use. The sanitizing compositions are hydroalcoholic, and contain a synergistic combination of skin-conditioning agents.
Abstract:
A novel approach to the removal of coffee and tea stains from dishes is disclosed. Tea, coffee and other stains caused by tannins are particularly difficult to remove and traditional techniques include harsh treatments that use bleach, or other environmentally undesirable chemicals such as phosphates, EDTA, NTA or other aminocarboxylates. Applicants have found that an acid rinse prior to alkaline cleaning of stained dishware such as ceramics porcelain and the like can remove up to one hundred percent of even aged coffee and tea stains.
Abstract:
The invention is directed to a fluid detergent composition comprising a di-amido gellant and a surfactant, and a method for structuring said composition.
Abstract:
A semiconductor wafer cleaning formulation, including l-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40%wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an imine, 20-50%wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.
Abstract:
A resin composition for cleaning a mold which removes stains adhered on the surface of a mold during the molding of a curable resin material, characterized in that it comprises a melamine resin as a mold cleaning resin, at least one guanamine and/or at least one guanamine resin, and a fibrous inorganic compound having an average fiber length of 5 to 30 mu m, an average fiber diameter of 0.1 to 1.0 mu m and an aspect ratio of 10 to 60.
Abstract:
Disclosed is a method for cleaning drains for fatty waste water from households or industrial enterprises. Nitrogenous compounds are added to the fat-reducing and/or fat-emulsifying bacteria contained in the waste water. The inventive method is characterised in that 1. urea, a urea derivative, a salt of the urea and/or a salt of a urea derivative is/are added to a liquid drain cleaning agent and in that 2. urea, a urea derivative, a salt of a urea and/or a salt of a urea derivative and/or waterless magnesium sulphate is/are added to a solid drain cleaning agent. Growth factors in the form of supplines can be widely excluded. The amount of germ-inhibiting, organic substances is below 0.5 g/kg in relation to the drain cleaning agent in 1. and 2. The invention also relates to a cleaning agent that contains the aforementioned compounds.
Abstract:
A detergent containing, as the active ingredient, a polyphosphoric acid-urea condensate as a product of reaction of orthophosphoric acid with urea, or a phosphoric acid-urea polymer, and used for cleaning the surfaces of metals and/or glasses in at least either a process for producing semiconductor devices or a process for producing liquid crystal devices. The detergent is highly safe from the standpoint of the environment and work and efficiently removes the etching residues and impurities on the surfaces of metals (inclusive of semimetals) and glasses without causing metal corrosion.
Abstract:
The invention provides a urea based solid composition and a process for preparing a homogeneous, urea-based, solid cleaning composition. Cleaning compositions for use in warewashing and cleaning hard surfaces, rinsing, sanitizing, deodorizing, and the like, made by the method are also provided. The ingredients are charged into a heated mixing apparatus and when uniform are transferred into a mold or other packaging system for dispensing the detergent. The consistency of the composition ranges from that of a fused solid block to a malleable article.