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发明公开
CN102759860A 涂敷处理装置、涂敷显影处理系统和涂敷处理方法 有权

涂敷处理装置、涂敷显影处理系统和涂敷处理方法
摘要：
本发明提供涂敷处理装置、涂敷显影处理系统和涂敷处理方法。该涂敷处理装置在利用旋涂法涂敷涂敷液而形成膜时，能够控制基板面内的任意位置的膜厚，并且能够减少基板面内的膜厚偏差。该涂敷处理装置(23)通过向旋转的基板的表面供给涂敷液并使供给来的涂敷液向基板的外周侧扩散，在基板的表面涂敷涂敷液，其包括：基板保持部(31)，其用于保持基板；旋转部(32)，其用于使被基板保持部保持的基板旋转；供给部(43)，其用于向被基板保持部保持的基板的表面供给涂敷液；气流控制板(63)，其设置在被基板保持部(31)保持的基板的上方的规定位置，用于使利用旋转部进行旋转的基板的上方的气流在任意的位置局部地变化。
摘要（英）：

The invention provides a oating treatment apparatus, a coating and developing treatment system, and a coating treatment method. The coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate,a rotation part rotating the substrate held on the substrate holding part,a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part,and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.

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